Photoelectric position measuring device.
Abstract
In the position measuring device according to Figure 1, a first grating (2) is illuminated in a so-called three-grating measuring arrangement at a specific angle ( alpha ). Two component beams (3, 4) obtained at the first grating (2) by diffraction impinge on a second grating (5) which represents the measure of the position measuring device. Renewed diffraction forms component beams (6, 6'; 7, 7') of which the two component beams (6 and 7) closest to the grating normal (0) impinge on a third grating (2') with the aid of which they are diffracted once again and caused to interfere. After the third grating (2') the component beams (8, 9 and 10, 11) whose intensity has been modulated by interference impinge on photodetectors (12, 19), which convert them into phase-shifted electrical signals and supply them to an evaluation device (not shown in more detail). …<IMAGE>…

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Projected expiry passed 24 December 2008, 17.7 years ago.
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9 claims: 9 independent, 0 dependent
- 1Photoelectric position measuring device for measuring lengths or angles according to the transmitted light or incident light principle, by means of a plurality of mutually displaceable gratings which diffract light coming from a light source and furthermore bring the diffracted partial beam bundles into interference, the intensity modulations of the partial beam bundles resulting from interference being phase-shifted by photodetectors electrical signals are converted, characterized in that the light coming from the light source (1) enters the first grating (2) at an angle of incidence (α) to the grating normal (0) and that the angle of incidence (α) and the physical properties of the first grating (2) are selected such that that only the partial beam (3) of the zeroth diffraction order and the partial beam (4) of the first diffraction order closest to the grating normal (0) contribute to signal formation by diffraction at the second grating (5) and the partial beams (3, 4) mentioned contribute a constant phase shift obtained by the amount Θ that the physical properties of the second grid (5) are selected so that the incident partial beams (3,4) are only in partial beams (6,6 ';7,7') of their first diffraction orders, and that the closest to the grating normal (0) partial beams (6,7) by diffraction on third grating (2 '), which is identical to the first grating (2), brought to interference and the respective interfering partial beams (8 and 9 or 10 and 11) meet the photodetectors (12, 13). 1. Lichtelektrische Positionsmeßeinrichtung zum Messen von Längen oder Winkeln nach dem Durchlicht- oder Auflichtprinzip, mittels mehrerer zueinander verschieblicher Gitter, die von einer Lichtquelle kommendes Licht beugen und ferner die gebeugten Teilstrahlenbündel zur Interferenz bringen, wobei die durch Interferenz entstehenden Intensitätsmodulationen der Teilstrahlenbündel durch Fotodetektoren in zueinander phasenversetzte elektrische Signale umgewandelt werden, dadurch gekennzeichnet, daß das von der Lichtquelle (1) kommende Licht unter einem Einfallswinkel (α ) zur Gitternormalen (0) in das erste Gitter (2) eintritt und daß der Einfallswinkel (α) sowie die physikalischen Eigenschaften des ersten Gitters (2) so gewählt sind, daß nur das Teilstrahlenbündel (3) der nullten Beugungsordnung und das Teilstrahlenbündel (4) der der Gitternormalen (0) am nächsten liegenden ersten Beugungsordnung zur Signalbildung durch Beugung am zweiten Gitter (5) beitragen und die genannten Teilstrahlenbündel (3,4) eine konstante Phasenschiebung um den Betrag Θ erhalten, daß die physikalischen Eigenschaften des zweiten Gitters (5) so gewählt sind, daß die einfallenden Teilstrahlenbündel (3,4) nur in Teilstrahlenbündel (6,6′;7,7′) ihrer ersten Beugungsordnungen zer legt werden, und daß die der Gitternormalen (0) am nächsten liegenden Teilstrahlenbündel (6,7) durch Beugung am dritten Gitter (2′), welches identisch mit dem ersten Gitter (2) ist, zur Interferenz gebracht werden und die jeweils interferierenden Teilstrahlenbündel (8 und 9 bzw. 10 und 11) auf die Fotodetektoren (12,13) treffen.
- 2Meßeinrichtung nach Anspruch 1, dadurch gekennzeichnet, daß der Einfallswinkel (α) so gewählt ist, daß die Bedingung α = arcsin (λ2g) erfüllt ist. 2nd Measuring device according to claim 1, characterized in that the angle of incidence (α) is selected such that the condition α = arcsin (λ2g) is satisfied.
- 3Meßeinrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die Gitterkonstanten (g) aller Gitter (2,2′,5) kleiner als die Wellenlänge ( ) des verwendeten Lichtes ist. 3rd Measuring device according to claim 1, characterized in that the grating constant (g) of all gratings (2,2 ′, 5) is smaller than the wavelength () of the light used.
- 4Meßeinrichtung nach Anspruch 1, dadurch gekennzeichnet daß die Gitterkonstanten (g) aller Gitter (2,2′,5) gleich sind. 4th Measuring device according to claim 1, characterized in that the lattice constants (g) of all gratings (2,2 ′, 5) are the same.
- 5Measuring device according to claim 1, characterized in that the land / groove ratio (duty cycle) of the first and third grids (2,2 ′) differs markedly from 1:1, while this ratio is 1: 1 for the second grating (5) and that the phase shift of the first and third grids (2.2 ') differs markedly from π radians and is equal to π radians for the second grating (5). 5. Meßeinrichtung nach Anspruch 1, dadurch gekennzeichnet, daß das Steg-/Furchenverhältnis (Tastverhältnis) des ersten und dritten Gitters (2,2′) merklich von 1:1 abweicht, während diese Verhältnis beim zweiten Gitter (5) 1:1 ist und daß der Phasenhub des ersten und dritten Gitters (2,2′) von π radian merklich abweicht und beim zweiten Gitter (5) gleich π radian ist.
- 6Measuring device according to claim 1, characterized in that the first and third grids (2,2 ′) scanning grids and the second grating (5) embody the scale of an incremental measuring device. 6. Meßeinrichtung nach Anspruch 1, dadurch gekennzeichnet, daß das erste und dritte Gitter (2,2′) Abtastgitter und das zweite Gitter (5) den Maßstab einer inkrementalen Meßeinrichtung verkörpern.
- 7Measuring device according to claim 6, characterized in that all gratings (2, 2 ′, 5) are designed as transparent gratings of a transmitted light measuring device. 7. Meßeinrichtung nach Anspruch 6, dadruch gekennzeichnet, daß alle Gitter (2,2′,5) als transparente Gitter einer Durchlichtmeßeinrichtung ausgebildet sind.
- 8Meßeinrichtung nach Anspruch 6, dadurch gekennzeichnet, daß das erste und dritte Gitter (2,2′) transparent und körperlich identisch sind, und daß das zweite Gitter (5) reflektierend als Gitter einer Auflichtmeßeinrichtung ausgebildet sind. 8th. Measuring device according to claim 6, characterized in that the first and third grids (2,2 ′) are transparent and physically identical, and in that the second grating (5) is designed reflectively as a grating of an incident light measuring device.
- 9Measuring device according to claim 1, characterized in that the light source (1) is a semiconductor laser diode with a downstream collimator for generating a flat wave field. 9. Meßeinrichtung nach Anspruch 1, dadurch gekennzeichnet, daß die Lichtquelle (1) eine Halbleiter-Laserdiode mit nachgeschaltetem Kollimator zur Erzeugung eines ebenen Wellenfeldes ist.
Independent claims9
17 paragraphs, as filed
The invention relates to a photoelectric position measuring device according to the preamble of claim 1.
Such an arrangement is described in DE-C2-24 31 551. A first embodiment of so-called three-grating measuring arrangements consists of three transparent grids, which are successively penetrated by the incident light. In a second embodiment, an arrangement is described which consists of only two gratings, one of which is transparent and the second is designed as a reflection grating. In the arrangements described there, the grating constant of the grating used cannot be less than the wavelength of the light used. This limits the resolution of the measuring arrangement.
Another three-grating measuring arrangement is described in EP-A1-163 362. Due to the special design of the phase grating shown there with respect to phase shift and duty cycle (ridge / furrow), three light beams are created which, when the grids move relative to one another, experience intensity modulations that are staggered in phase (preferably 120 °). With this arrangement, too, the grating constant cannot be smaller than the wavelength of the incident light.
A so-called two-grating measuring arrangement is known from DE-A1-21 46 310, in which the grating constants of the grids used are smaller than the wavelength of the incident light. A fundamental disadvantage of such interferometric two-grating measuring arrangements is that they are sensitive to fluctuations in the spacing of the grids from one another and are dependent on the spatial coherence of the light used.
The object of the invention, in contrast, is to provide a position measuring device with three grids in terms of effectiveness, which are scanned interferometrically and also allow grating constants which are smaller than the wavelength of the light used. In addition, the scanning signals should be harmonic free.
This object is achieved by a position measuring device with the features of claim 1.
With the help of exemplary embodiments, the invention will be explained in more detail with reference to the highly schematic drawings.
It shows<ul id="ul0001" list-style="none"><li>FIG. 1 shows a transmitted light arrangement,</li><li>Figure 2 shows an enlarged detail of a phase grating and</li><li>FIG. 3 shows an enlarged detail of another phase grating.</li></ul>
In the transmitted light arrangement shown in FIG. 1, a phase grating 2 is illuminated at an angle α to the grating normal 0 by a light source 1 which emits narrowband light. The angle α is determined according to the formula sin α = λ / 2 g, where λ is the wavelength of the light used and g is the grating constant. Behind the phase grating 2, two partial beams 3 and 4 of the diffraction orders "0" and "1" are created by diffraction. These partial beams 3 and 4 hit a further grating 5, which is preferably also designed as a phase grating. This grating 5 is designed so that no zeroth diffraction order is created. This design can be done in a known manner by the surface design of the grating 5, for example in the case of a grating with a rectangular profile by varying the step height, which corresponds to the variation of the phase shift (see FIG. 2).
Since the grating constant g in the grating 5 is also smaller than the wavelength λ, there are also no diffraction orders with an ordinal number greater than "1". Of the four partial beams 6, 6 'formed on the grating 5 by diffraction; 7, 7 'only the partial beams 6 and 7 bent towards the grating normal 0 are used. The partial beams 6 and 7 meet another grating 2 '- which is identical in physical properties to the grating 2 - and are in turn diffracted at this grating 2'. Behind the grating 2 'you get four diffracted partial beams 8, 9, 10, 11. Each two of the partial beams, namely 8 and 9 and 10 and 11 have the same direction and can thus interfere with each other.
When the grating 5 is shifted by the amount x compared to the grids 2 and 2 ', the partial beams 6 and 7 diffracted on the grating 5 receive a phase shift Φ = 2πx / g or Φ = -2πx / g.
The gratings 2 and 2 'are designed so that when a beam is diffracted, the resulting partial beams of the zero and first order receive a constant phase shift by the amount Θ. The partial beams 3 and 4 are therefore delayed in their phase by the amount Θ to each other. Likewise, the partial beams 8 and 10 formed from the partial beam 6 on the grating 2 'and the partial beams 9 and 11 formed from the partial beam 7.
The aforementioned phase shift by the amount Θ is achieved by a special design of the grids 2 and 2 '. A possible embodiment is disclosed in EP-A1-163 362. This particular design consists of a phase grating with a rectangular profile in that the land / groove ratio (duty cycle) a: b differs markedly from 1: 1 and the step height h is designed according to Figure 2 so that the grating 2, 2 'a clearly phase deviation deviating from π radian.
The interfering partial beams 8 and 9 or 10 and 11 fall on photo elements 12 and 13 and are converted into electrical signals which are evaluated in a manner known in the case of incremental position measuring devices.
The signals can be described by the following formulas: For the photo element 12 I 12 = K (1-cos (2.2πx / g)) and for the photo element 13 I 13 = K (1-cos (2 (2π<maths id="math0001" num=""><math display="inline"><mrow><mfrac><mrow><mtext>x</mtext></mrow><mrow><mtext>G</mtext></mrow></mfrac></mrow></math><img file="EP0333929A2_D0001.tif" /></maths> - Θ))), where K is a constant, x denotes the shift of the grids 2, 2 'and 5 to each other and Θ the phase shift already described.
According to the example described above, a position measuring device based on the incident light principle can also be implemented in an analogous manner. The grating 5 is designed as a reflection grating and the grating 2 and 2 'are physically identical. In this case, FIG. 1 can be regarded as an "unfolded" representation.
The advantages of the position measuring device according to the invention over the arrangements mentioned in the introduction to the description are that a high resolution is achieved without subsequent interpolation, and that the spacing of the gratings from one another can vary within wide limits without the signals being adversely affected. Furthermore, there is only a small requirement for the spatial coherence of the light source. Furthermore, the signals generated at the photo elements are harmonic-free, since they are caused by the interference of only two partial beams, so that an optimal evaluation of these signals is guaranteed.
4 sheets
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Every citation, both ways
| Document | Relation | Office | Cited during |
|---|---|---|---|
| EP0603905A3 | Cited by | European Patent Office (EPO) | Search report |
| US5680211A | Cited by | United States of America | Search report |
| EP0446691A2 | Cited by | European Patent Office (EPO) | Search report |
| EP0590163A1 | Cited by | European Patent Office (EPO) | Search report |
| EP0603905A2 | Cited by | European Patent Office (EPO) | Search report |
| EP0446691A3 | Cited by | European Patent Office (EPO) | Search report |
| CN110622059A | Cited by | China | Search report |
| EP0513427A1 | Cited by | European Patent Office (EPO) | Search report |
| EP0163362A1 | Cites | European Patent Office (EPO) | Examiner |
| DE2003492A1 | Cites | Germany | Search report |
| DE2238413B2 | Cites | Germany | Search report |
10 members in 5 offices
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 3810165 | Germany | A | |
| 3810165 | Germany | – | |
| 3810165 | – | – | – |
| DE19883810165 | – | – | – |
Members10
| Document | Office | Kind | |
|---|---|---|---|
| DE3810165C1 | Germany | C1 | |
| EP0333929A2This record | European Patent Office (EPO) | A2 | |
| JPH01276020A | Japan | A | |
| DE8816647U1 | Germany | U1 | |
| EP0333929A3 | European Patent Office (EPO) | A3 | |
| US5009506A | United States of America | A | |
| EP0333929B1 | European Patent Office (EPO) | B1 | |
| AT89920T | Austria | T | |
| DE3881379D1 | Germany | D1 | |
| JPH06103194B2 | Japan | B2 |
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Numbers
- Publication
- 0333929
- Publication, DOCDB
- 0333929
- Publication, EPODOC
- EP0333929
- Application
- 88121670
- Application, DOCDB
- 88121670
- Application, EPODOC
- EP19880121670
Titles3
- German
- Lichtelektrische Positionsmesseinrichtung.
- English
- Photoelectric position measuring device.
- French
- Dispositif photoélectrique pour la mésure de position.
Classification
- CPC, 1
- G01D5/38
- IPC, 6
- G01D5 26
- G01B11 00
- G01B11 02
- G01D5 38
- G01P3 36
- G02B27 44
Designated states10
- Contracting states, 10
- Austria
- Switzerland
- Germany
- France
- United Kingdom
- Italy
- Liechtenstein
- Spain
- Netherlands (Kingdom of the)
- Sweden