EP0332784A2

A process of treating magnetic recording media and slider bodies.

Abstract

A process for treating a carbon layer of a magnetic recording medium, includes the steps of enclosing a magnetic recording medium within a chamber (36), the medium including a substrate (18), a recording layer (24) of magnetisable material formed over the substrate, and an outer carbon layer (26) over the recording layer. An inert gas plasma at a pressure substantially less than atmospheric pressure is generated and maintained within the chamber (36) for an amount of time substantially to clean exposed surface areas of the carbon layer (26). Following the cleaning, a plasma mixture at a selected pressure substantially less than atmospheric pressure and at a selected temperature is generated and maintained within the chamber (36) for a selected time to fluorinate at least a portion of the carbon layer (26). The plasma mixture consists essentially of a reactive gas and an inert gas, the reactive gas comprising at least 60% by volume of the mixture and being carbon tetrafluoride and/or fluorine. A similar process is applicable to treating an exposed surface of a slider body formed of a ceramic material.

EP0332784A2, drawing sheet 1
Sheet 1 of 3

Term

Term ended

Projected expiry passed 14 December 2008, 17.8 years ago.

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16 claims: 12 independent, 4 dependent

  1. 1
    A process for treating a carbon layer on a magnetic recording medium characterised by including the steps of:enclosing a magnetic recording medium within a chamber (36), said medium including a substrate (18), a recording layer (24) of magnetisable material formed over the substrate, and an outer carbon layer (26) over the recording layer;generating and maintaining within said chamber (36) an inert gas plasma at a pressure substantially less than atmospheric pressure and for an amount of time necessary substantially to clean exposed surface areas of said carbon layer (26);and following said cleaning, generating and maintaining within the chamber (36) a plasma mixture at a selected pressure substantially less than atmospheric pressure, at a selected temperature and for a selected time to fluorinate at least a portion of said carbon layer (26), wherein said plasma mixture consists essentially of a reactive gas and an inert gas, said reactive gas comprising at least 60% by volume of the mixture and including carbon tetrafluoride and/or fluorine.
  2. 2
    A process for treating an exposed surface of a slider body formed of a ceramic material, characterised by including the steps of:enclosing within a plasma chamber (36) a slider body (64) consisting essentially of a ceramic material;generating and maintaining within said plasma chamber (36) an inert gas plasma at a pressure substantially less than atmospheric pressure for an amount of time selected substantially to etch an exposed surface of said slider body (64);and following said etching, generating and maintaining within said chamber (36) a plasma mixture at a selected pressure substantially less than atmospheric pressure, at a selected temperature and for a selected time to enable carbon and fluorine ion implantation to at least a selected depth, wherein said plasma mixture consists essentially of carbon tetrafluoride and an inert gas, with said carbon tetrafluoride comprising at least 60% by volume of said mixture.
  3. 4
    A process as claimed in any preceding claim characterised in that the carbon tetrafluoride comprises from 75% to 85% of said mixture.
  4. 5
    A process as claimed in any preceding claim characterised in that the carbon tetrafluoride comprises 80% of said mixture.
  5. 6
    A process as claimed in any preceding claim characterised in that said selected pressure is in the range of from 27 Pa to 54 Pa (200 to 400 millitorr).
  6. 7
    A process as claimed in any preceding claim characterised in that said selected time is approxi­mately 25 to 30 minutes.
  7. 8
    A process as claimed in any preceding claim characterised in that the cleaning or etching is carried out at room temperature.
  8. 9
    A process as claimed in any of claims 1 to 7 characterised in that the cleaning or etching is carried out at about 100°C.
  9. 10
    A process as claimed in any preceding claim characterised in that the selected temperature is room temperature.
  10. 11
    A process as claimed in any of claims 1 to 9 characterised in that the selected temperature is about 100°C.
  11. 12
    An apparatus for storing magnetic data, said apparatus including:a substantially rigid substrate (18);a data storage layer (24) consisting essentially of a magnetisable material applied over the substrate;and an outer layer (26) formed over said data storage layer (24) and consisting essentially of carbon, characterised by penetration of carbon and fluorine ions and the formation of extended chain fluoropolymers over at least an outer portion of said carbon layer.
  12. 15
    A slider for a magnetic data transducing head, said slider comprising:a slider body (64) consisting essentially of a ceramic material and having a substan­tially flat interfacing surface (70,72), characterised in the implantation of fluorine ions in said slider body throughout a layer of said slider body including said interfacing surface.