EP0194530A3
Method for controlling the plating rate in an electroless plating process
Abstract
Method for controlling plating in an electroless plating process. The plating rate is continuously monitored. The plating rate is compared with a set point plating rate. A control voltage is derived proportional to the difference in .plating rate and the desired plating rate, the integral of the difference, and the derivative of the difference. The control voltage is applied to a replenishment control for controlling the replenishment rate of a constituent chemical of the plating process.
Term
Term ended
Projected expiry passed 28 February 2006, 20.6 years ago.
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- Filed
- Published
- Projected expiry
- Today
1 sheet
Sheet 1
Every citation, both waysCites: the store holds 1 of 2
| Document | Relation | Office | Category | Cited during |
|---|---|---|---|---|
| FR2371522A1 | Cites | France | X | Search report |
| PATENTS ABSTRACTS OF JAPAN, vol. 7, no. 252 (C-194)[1397], 9th November 1983; JP-A-58 136 761 (CHIYUUSHIYOU KIGIYOU SHINKOU JIGIYOUDAN) 13-08-1983 | Non-patent | – | – | Search report |
8 members in 5 offices
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 709955 | United States of America | – | |
| 70995585 | United States of America | A | |
| 709955 | – | – | – |
| US19850709955 | – | – | – |
Members8
| Document | Office | Kind | |
|---|---|---|---|
| JPS61204379A | Japan | A | |
| EP0194530A2 | European Patent Office (EPO) | A2 | |
| US4623554A | United States of America | A | |
| EP0194530A3This record | European Patent Office (EPO) | A3 | |
| CA1223157A | Canada | A | |
| JPH0215634B2 | Japan | B2 | |
| EP0194530B1 | European Patent Office (EPO) | B1 | |
| DE3685241D1 | Germany | D1 |
23 legal events, as 3 offices reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | Office | |
|---|---|---|---|
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| Gb: european patent ceased through non-payment of renewal feeCeasedGBPC | GBPC | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| European patent in force as of 2002-01-01IF02 | IF02 | GB | |
| Notification of lapseLapsedST | ST | FR | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| Annual fee paid to national office [announced via postgrant information from national office to epo]GrantedPGFP | PGFP | EP | |
| No opposition filedOpposition26N | 26N | EP | |
| No opposition filed within time limitOppositionORIGINAL CODE: 0009261PLBE | PLBE | EP | |
| Fr: translation filedET | ET | EP | |
| Corresponds to:REF | REF | EP | |
| Designated contracting statesAK | AK | EP | |
| Lapsed in a contracting state [announced via postgrant information from national office to epo]LapsedPG25 | PG25 | EP | |
| (expected) grantORIGINAL CODE: 0009210GRAA | GRAA | EP | |
| Information on the status of an ep patent application or granted ep patentGrantedSTATUS: THE PATENT HAS BEEN GRANTEDSTAA | STAA | EP | |
| First examination report despatched17Q | 17Q | EP | |
| Request for examination filed17P | 17P | EP | |
| Designated contracting statesAK | AK | EP | |
| Search report despatchedORIGINAL CODE: 0009013PUAL | PUAL | EP | |
| Designated contracting statesAK | AK | EP | |
| Public reference made under article 153(3) epc to a published international application that has entered the european phaseORIGINAL CODE: 0009012PUAI | PUAI | EP |
Numbers
- Publication
- 0194530
- Publication, DOCDB
- 0194530
- Publication, EPODOC
- EP0194530
- Application
- 86102645
- Application, DOCDB
- 86102645
- Application, EPODOC
- EP19860102645
Titles3
- English
- METHOD FOR CONTROLLING THE PLATING RATE IN AN ELECTROLESS PLATING PROCESS
- French
- Procédé de contrôle de la vitesse d'un dépôt chimique
- German
- Verfahren zur Kontrolle der Niederschlagsrate beim stromlosen Plattieren
Classification
- CPC, 3
- C23C18/1683
- C23C18/1617
- C23C18/405
- IPC, 4
- H05K3 18
- C23C18 16
- C23C18 31
- C23C18 40
Designated states1
- Contracting states, 1
- Italy