Glow-discharge decomposition apparatus
Abstract
A glow-discharge decomposition apparatus comprising ground electrodes, substrates, RF-electrodes, a RF-power supply, a matching circuit and a controlling circuit having at least one electric element; each of the substrates being provided on the ground electrodes which are placed over each of the RF-electrories in parallel to each other; each of the RF-electrodes standing in parallel and being electrically insulated to each other; the matching circuit being connected to accept a RF-power from the RF-power supply; the controlling circuit being connected to accept a RF-power from the matching circuit; and the outputs of the controlling circuit being connected to supply RF-powers to- the RF-electrodes. The films are fabricated on the substrates by supplying RF-powers being independently controlled via the controlling circuit, thereby plasmas are controlled over each of the RF-electrodes. Thus, deposition rates are individually controlled and uniform films are fabricated on each of the substrates.

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Every citation, both ways
| Document | Relation | Office | Category | Cited during |
|---|---|---|---|---|
| US4264393A | Cites | United States of America | A | Search report |
| US4287851A | Cites | United States of America | A | Search report |
| US4381965A | Cites | United States of America | A | Search report |
| APPLIED PHYSICS LETTERS, vol. 44, no. 11, 1st June 1984, pages 1049-1051, American Institute of Physics, New York, US; T. HAMASAKI et al.: "New mode of plasma deposition in a capacitively coupled reactor" | Non-patent | – | – | Search report |
20 members in 9 offices; this record represents the family
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 12951984 | Japan | – | |
| 12951984 | Japan | A | |
| 13754784 | Japan | – | |
| 13754784 | Japan | A |
Members20
| Document | Office | Kind | |
|---|---|---|---|
| EP0165618A2 | European Patent Office (EPO) | A2 | |
| AU4394085A | Australia | A | |
| JPS618914A | Japan | A | |
| JPS6115321A | Japan | A | |
| KR860000703A | Republic of Korea | A | |
| CN85104968A | China | A | |
| CN85104968A | China | A | |
| US4664890A | United States of America | A | |
| IN163964B | India | B | |
| EP0165618A3This record | European Patent Office (EPO) | A3 | |
| AU591063B2 | Australia | B2 | |
| KR900001234B1 | Republic of Korea | B1 | |
| CA1269950A | Canada | A | |
| CA1269950C | Canada | C | |
| CN1014082B | China | B | |
| EP0165618B1 | European Patent Office (EPO) | B1 | |
| DE3586637D1 | Germany | D1 | |
| DE3586637T2 | Germany | T2 | |
| JPH0719750B2 | Japan | B2 | |
| JPH0719751B2 | Japan | B2 |
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Numbers
- Publication
- 0165618
- Application
- 851076984
Titles3
- German
- Vorrichtung zum Zersetzen mittels einer Glimmentladung
- English
- Glow-discharge decomposition apparatus
- French
- Appareil pour décomposer à l'aide d'une décharge luminescente
Classification
- CPC, 8
- H01J37/32174
- H01J37/32045
- B09C1/02
- C23C16/509
- H01J37/32082
- Y10S422/907
- H01J37/32183
- H01J37/32559
- IPC, 4
- H01L21 20
- B09C1 02
- C23C16 509
- H01J37 32
Designated states9
- Contracting states, 9
- Belgium
- Switzerland
- Germany
- France
- United Kingdom
- Italy
- Liechtenstein
- Netherlands (Kingdom of the)
- Sweden