CA2402040C

Chemical vapor deposition apparatus and method

Abstract

Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.

CA2402040C, drawing sheet 1
Sheet 1 of 5

Term

Term ended

Expired 9 September 2022, 4 years ago.

  1. Priority
  2. Filed
  3. Granted
  4. Expired
  5. Today

15 claims: 4 independent, 11 dependent

  1. 1
    CA 02402040 2009-05-19 50989-68 - 14CLAIMS:1. A method of chemical vapor deposition, comprising: flowing coating gas into in a preheat conduit disposed in and along a length of a heated coating chamber;heating said coating gas as it flows through said preheat conduit;discharging the preheated coating gas into a gas distribution conduit in said coating chamber;and discharging the coating gas from the gas distribution conduit through a plurality of gas discharge openings at an opposing manifold wall having a plurality of gas flow openings out of alignment with said gas discharge openings such that there is no line-of-sight gas flow path from said gas distribution openings to said gas flow openings.
  2. 10
    11. A method of chemical vapor deposition, comprising:flowing coating gas in a preheat conduit into disposed in and along a length of a heated coating chamber;discharging the coating gas into a gas distribution conduit disposed about said preheat conduit in said coating chamber;and supplying said coating gas from said gas distribution conduit to a plurality of coating zones along a length of said coating chamber including discharging the coating gas from the gas distribution conduit through gas discharge openings at an opposing manifold wall disposed between each coating zone and said gas distribution conduit and flowing the coating gas through a plurality of gas flow openings disposed in each manifold wall to each coating zone with the gas flow openings being out of alignment with said gas discharge openings such that there is no line-of-sight gas flow path from said gas discharge openings to said gas flow openings at each coating zone.
  3. 13
    14. A method of chemical vapor deposition, comprising:flowing coating gas in a preheat conduit disposed in and along a length of a heated coating chamber;CA 02402040 2010-07-20 50989-68 -16heating the coating gas as it flows through the preheat conduit;and discharging the preheated coating gas from a lower end thereof into a gas distribution conduit in the coating chamber, including also discharging the preheated coating gas from the preheat conduit through a bleed opening above 5 the lower end of said preheat conduit into the gas distribution conduit.
  4. 15
    16. A method of chemical vapor deposition, comprising:10 flowing coating gas in a gas distribution conduit in a coating chamber;discharging the coating gas laterally from the gas distribution conduit to an annular manifold located about the gas distribution conduit laterally between the gas distribution conduit and an annular coating zone, the annular manifold 15 comprising a perforated annular supply manifold wall and having gas flow openings of the manifold communicated to the coating zone;and exhausting spent coating gas from the coating zone through openings in an annular baffle located about and outwardly of the coating zone, the annular baffle comprising a perforated annular exhaust manifold wall. 20 17. A method of chemical vapor deposition, comprising: flowing coating gas in a gas distribution conduit in a heated coating chamber;discharging the coating gas from the gas distribution conduit laterally through gas discharge openings at an opposing manifold wall of an empty 25 manifold disposed laterally between a coating zone and said gas distribution conduit;and flowing the coating gas through a plurality of gas flow openings disposed in the manifold wall to the coating zone with the gas flow openings being CA 02402040 2010-07-20 50989-68 -17out of alignment with said gas discharge openings such that there is no line-ofsight gas flow path from said gas discharge openings to said gas flow openings through said empty manifold to the coating zone.