Nova Patents
CA2390002C

On-line sensor for colloidal substances

Abstract

A method and apparatus for determining and controlling a property of colloidal substances thatundergo at least one of a temperature dependent phase transition and a temperature dependentadsorption-desorption process is disclosed. The colloidal particles are characterized byperforming successive measurements of light attenuation or emission by a colloidal mixture attwo or more temperatures and at one or more wavelength. The difference or ratio of themeasurements at two or more temperatures provides a measure of the colloidal stability withrespect to temperature. The amount of certain organic colloids that are unstable to temperaturevariation may be determined from the magnitude of the measurement change. This method maybe specifically applied to determining the tackiness and propensity to deposit of colloidal pitch orwood resin in pulp or paper process water as an indication of the effectiveness of a chemicalcontrol program. In this context a feedback signal may be provided for use by a process controller to achieve improved process control.

CA2390002C, drawing sheet 1
Sheet 1 of 28

Term

Term ended

Expired 10 June 2022, 4.3 years ago.

  1. Priority
  2. Filed
  3. Granted
  4. Expired
  5. Today

38 claims: 4 independent, 34 dependent

  1. 1
    CA 02390002 2002-06-10 Doc. No. 51 -12 CA (CIP) Patent Claims What is claimed is:1. A method for controlling a characteristic of a colloidal mixture comprising the steps of: providing a colloidal mixture for analysis by thermal difference spectroscopy;determining a value indicative of the characteristic of the colloidal mixture by the steps of: irradiating at least a first portion of the colloidal mixture with light in an ultraviolet-visible region at a first temperature and obtaining a first measurement of a first wavelength within the ultraviolet-visible region, said first measurement for obtaining a measure of one of an absorption, emission and scattering of the first wavelength when said colloidal mixture is irradiated with the light, waiting for the temperature of the colloidal mixture to change, irradiating at least a second portion of the colloidal mixture with light in an ultraviolet-visible region at a second different temperature and obtaining a second measurement of the first wavelength within the ultraviolet-visible region, said second measurement for obtaining a measure of one of an absorption, emission and scattering of the first wavelength when said colloidal mixture is irradiated with the light, and determining the value indicative of the characteristic of the colloidal mixture from a relationship including the first measurement and the second measurement;determining, in dependence upon the determined value, an adjustment to at least a variable of a control process for affecting at least a characteristic of the colloidal mixture;providing a feedback signal in dependence upon the determined adjustment to an automated controller of the control process;and adjusting automatically the variable of the control process in dependence upon the provided feedback signal.
  2. 12
    A method for controlling a process parameter of a process involving a colloidal mixture comprising the steps of:providing at least a first portion of the colloidal mixture for an optical measurement by the steps of: providing a portion of the colloidal mixture to an in-line centrifuge unit to separate particulate matter therefrom, to obtain an approximately fiber-free sample;and providing the approximately fiber-free sample as the at least a first portion;determining a value indicative of a characteristic of the colloidal mixture by the steps of: irradiating the at least a first portion of the colloidal mixture with light in an ultraviolet-visible region at a first temperature and obtaining a first measurement of a first wavelength within the ultraviolet-visible region, said first measurement for obtaining a measure of one of an absorption, emission and scattering of the first wavelength when said colloidal mixture is irradiated with the light;waiting for the temperature of the colloidal mixture to change;irradiating the at least a first portion of the colloidal mixture with light in an ultraviolet-visible region at a second different temperature and obtaining a second measurement of the first wavelength within the ultraviolet-visible region, said second measurement for obtaining a measure of one of an absorption, emission and scattering of the first wavelength when said colloidal mixture is irradiated with the light;and determining the value indicative of the characteristic of the colloidal mixture from a relationship including the first measurement and the second measurement;determining, in dependence upon the determined value, an adjustment to the process parameter of the process involving the colloidal mixture;providing to an automated controller of the process involving the colloidal mixture a feedback signal in dependence upon the determined adjustment;and adjusting automatically the process parameter of the process in dependence upon the provided feedback signal. CA 02390002 2002-06-10 Doc. No. 51 -12 CA (CIP) Patent
  3. 18
    A method for controlling a characteristic of a colloidal mixture comprising the steps of:providing a colloidal mixture for analysis by thermal difference spectroscopy;determining a value indicative of the characteristic of the colloidal mixture by the steps of: irradiating at least a first portion of the colloidal mixture with light in an ultraviolet-visible region at a first temperature and obtaining at least a first measurement of a first and a second wavelength within the ultraviolet-visible region, said first measurement for obtaining one of an absorption, emission and scattering of the first wavelength when said colloidal mixture is irradiated with the light, waiting for the temperature of the colloidal mixture to change, CA 02390002 2002-06-10 Doc. No. 51 -12 CA (CIP) Patent irradiating at least a second portion of the colloidal mixture with light in an ultraviolet-visible region at a second different temperature and obtaining at least a second measurement of the first and the second wavelength within the ultraviolet-visible region, said second measurement for obtaining one of an absorption, emission and scattering of the second wavelength when said colloidal mixture is irradiated with the light, and determining the value indicative of the characteristic of the colloidal mixture from a relationship including a ratio of the at least first and second measurement;determining, in dependence upon the determined value, an adjustment to at least a variable of a control process for affecting at least a characteristic of the colloidal mixture;providing a feedback signal in dependence upon the determined adjustment to an automated controller of the control process;and adjusting automatically the variable of the control process in dependence upon the provided feedback signal.
  4. 29
    An on-line optical sensor apparatus for controlling a process parameter of a process involving a colloidal mixture comprising:an in-line centrifuge unit for separating fiber from the colloidal mixture to obtain an approximately fiber-free liquid sample;a detector for obtaining a first measurement and a second measurement of light in an ultraviolet-visible region, said first measurement for obtaining a measure of one of an absorption, emission and scattering of at least a first wavelength of the light at a first temperature when the approximately fiber-free liquid sample of the colloidal mixture is irradiated with the light, and said second measurement for obtaining a measure of one of an absorption, emission and Doc. No. 51-12 CA (CIP) Patent . ι Tuun ii CA 02390002 2002-06-10 scattering of the first wavelength of the light at a second different temperature when the approximately fiber-free liquid sample of the colloidal mixture is irradiated with the light;and a suitably programmed processor in electrical communication with an automated process controller for providing thereto a signal indicative of an adjustment to the process parameter, wherein said adjustment is determined in dependence upon a characteristic of the colloidal mixture, and wherein said characteristic of the colloidal mixture is determined from a relationship including the first and second measurement.