Ion beam process for deposition of highly abrasion-resistantcoatings

An ion beam deposition method is provided for manufacturing a coated substrate with improved abrasion resistance, and improved lifetime. The substrate is first chemically cleaned to remove contaminants. Secondly, the substrate is inserted into a vacuum chamber (1) on holder (3), and the air therein is evacuated via pump (2). Then the substrate surface is bombarded with energetic ions from ion beam source (4) supplied from inert (5) or reactive (6) gas inlets to assist in removing residual hydrocarbons and surface oxides, and activating the surface. After sputter-etching the surface, a protective, abrasion-resistant coating is deposited by ion beam deposition where reactive gas inlets (7, 8 and 9) may be employed. The ion beam-deposited coating may contain one or more layers. Once the chosen coating thickness is achieved, deposition is terminated, vacuum chamber pressure is increased to atmospheric pressure and the coated substrate products having improved abrasion-resistance are removed from the chamber. These coated products may be plastic sunglass lenses, ophthalmic lenses, bar codes scanner windows, and industrial wear parts needing protection from scratches and abrasion.