ATE72060T1

Positive photoresist systems

Abstract

This invention concerns a positive photoresist comprising a preformed, non-crosslinked polglutarimide dissolved in a non-aqueous, spinning solvent. The positive photoresist may be used to achieve high resolution images by exposure to a wide range of wavelengths and development using an aqueous base developer. The photoresist is also suitable for use as a planarizing layer in a multiple layer system.

Term

Term ended

Projected expiry passed 20 November 2004, 21.8 years ago.

23 members in 15 offices

This recordMember, by publication datePriority claim5 more offices are in the list below

Priority claims1

Priority claims
Document	Office	Kind	Date
55322183	United States of America	A	1983-11-21

Members23

Family members, oldest first
Document	Office	Kind
IL73571A0	Israel	A0	1985-02-28
IL73571D0	Israel	D0	1985-02-28
AU3573684A	Australia	A	1985-05-30
US4524121A	United States of America	A	1985-06-18
EP0145355A2	European Patent Office (EPO)	A2	1985-06-19
KR850003991A	Republic of Korea	A	1985-06-29
BR8405909A	Brazil	A	1985-09-10
JPS60185946A	Japan	A	1985-09-21
ZA849071B	South Africa	B	1985-12-24
EP0145355A3	European Patent Office (EPO)	A3	1987-05-27
PH21412A	Philippines	A	1987-10-15
CA1228498A	Canada	A	1987-10-27
IL73571A	Israel	A	1988-05-31
AU581193B2	Australia	B2	1989-02-16
KR910007245B1	Republic of Korea	B1	1991-09-24
EP0145355B1	European Patent Office (EPO)	B1	1992-01-22
AT72060T	Austria	T	1992-02-15
ATE72060T1This record	Austria	T1	1992-02-15
DE3485477D1	Germany	D1	1992-03-05
HK44992A	Hong Kong, China	A	1992-06-26
SG35292G	Singapore	G	1992-07-24
MY103750A	Malaysia	A	1993-09-30
JPH073579B2	Japan	B2	1995-01-18

2 legal events, as the office reported them to INPADOC

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Events

Legal events, newest first
	Event	Code
1997-08-15	Ceased due to non-payment of the annual feeCeasedREN	REN
1992-09-15	Publication of translation of european patent specificationUEP	UEP