ATE545148T1

Thermal sprayed yttria-containing coating for plasma reactor

Abstract

Components of semiconductor processing apparatus comprise thermal sprayed yttria-containing coatings that provide erosion, corrosion and/or corrosion-erosion resistance in plasma atmospheres. The coatings can protect substrates from physical and/or chemical attack.

Term

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Projected expiry passed 12 June 2023, 3.3 years ago.

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21 members in 9 offices

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DocumentOfficeKindDate
18050402United States of AmericaA
0318502United States of AmericaW

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US2004002221A1United States of AmericaA1
WO2004003962A2World Intellectual Property Organization (WIPO)A2
AU2003238006A1AustraliaA1
AU2003238006A8AustraliaA8
WO2004003962A3World Intellectual Property Organization (WIPO)A3
TW200412827ATaiwan Province of ChinaA
KR20050008855ARepublic of KoreaA
EP1518255A2European Patent Office (EPO)A2
US2005150866A1United States of AmericaA1
CN1663017AChinaA
JP2005531157AJapanA
US7300537B2United States of AmericaB2
US7311797B2United States of AmericaB2
TWI328411BTaiwan Province of ChinaB
JP2010283361AJapanA
KR20110015676ARepublic of KoreaA
KR101030935B1Republic of KoreaB1
EP1518255B1European Patent Office (EPO)B1
KR101107542B1Republic of KoreaB1
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ATE545148T1This recordAustriaT1