ATE526682T1
Integration process flow for flash devices with low gap fill aspect ratio
Abstract
This record has no abstract on file.
Term
0 yearsto projected expiry
Projected expiry 10 October 2026, counted from filing; an application has no term until it is granted.
- Priority
- Filed
- Published
- Today
- Projected expiry
19 members in 8 offices
Priority claims2
| Document | Office | Kind | Date |
|---|---|---|---|
| 25414205 | United States of America | A | |
| 2006039931 | United States of America | W |
Members19
| Document | Office | Kind | |
|---|---|---|---|
| US820282A | United States of America | A | |
| US2007087504A1 | United States of America | A1 | |
| WO2007047390A2 | World Intellectual Property Organization (WIPO) | A2 | |
| WO2007047390A3 | World Intellectual Property Organization (WIPO) | A3 | |
| TW200731473A | Taiwan Province of China | A | |
| EP1938371A2 | European Patent Office (EPO) | A2 | |
| KR20080075086A | Republic of Korea | A | |
| CN101288164A | China | A | |
| JP2009512228A | Japan | A | |
| US7541240B2 | United States of America | B2 | |
| CN101288164B | China | B | |
| KR101029696B1 | Republic of Korea | B1 | |
| EP2320455A1 | European Patent Office (EPO) | A1 | |
| EP1938371B1 | European Patent Office (EPO) | B1 | |
| AT526682T | Austria | T | |
| ATE526682T1This record | Austria | T1 | |
| JP4950207B2 | Japan | B2 | |
| EP2320455B1 | European Patent Office (EPO) | B1 | |
| TWI384588B | Taiwan Province of China | B |
Numbers
- Application
- 6825851
Titles2
- English
- INTEGRATION PROCESS FLOW FOR FLASH DEVICES WITH LOW GAP-FILL ASPECT RATIO
- German
- INTEGRATIONSPROZESSABLAUF FÜR FLASH-BAUSTEINE MIT NIEDRIGEM LÜCKENFÜLL-SEITENVERHÄLTNIS
Classification
- CPC, 5
- H10B41/40
- H10B41/42
- H10P52/403
- H10B69/00
- H10P50/283
- IPC, 6
- H10D30 01
- H10B69 00
- H10B99 00
- H10D30 68
- H10D30 69
- H10D84 00