Nova Patents
ATE445176T1

Spin-on-glass anti-reflective coatings for photolithography

Abstract

Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.

Term

Term ended

Projected expiry passed 8 June 2020, 6.3 years ago.

  1. Priority
  2. Filed
  3. Published
  4. Projected expiry
  5. Today

86 members in 11 offices

This recordMember, by publication datePriority claim1 more office is in the list below

Priority claims3

Priority claims
DocumentOfficeKindDate
33024899United States of AmericaA
49116600United States of AmericaA
0015772United States of AmericaW

Members86

Family members, oldest first
DocumentOfficeKind
CA2374944A1CanadaA1
WO0077575A1World Intellectual Property Organization (WIPO)A1
AU5600200AAustraliaA
US6268457B1United States of AmericaB1
EP1190277A1European Patent Office (EPO)A1
US6365765B1United States of AmericaB1
US2002055000A1United States of AmericaA1
KR20020036956ARepublic of KoreaA
US2002095018A1United States of AmericaA1
US2002128388A1United States of AmericaA1
US6506497B1United States of AmericaB1
JP2003502449AJapanA
WO03044078A1World Intellectual Property Organization (WIPO)A1
WO03044079A1World Intellectual Property Organization (WIPO)A1
WO03044600A1World Intellectual Property Organization (WIPO)A1
AU2002227106A1AustraliaA1
AU2002336709A1AustraliaA1
AU2002359387A1AustraliaA1
US2003120018A1United States of AmericaA1
TW200302259ATaiwan Province of ChinaA
TW200306342ATaiwan Province of ChinaA
WO03044078A9World Intellectual Property Organization (WIPO)A9
TW570964BTaiwan Province of ChinaB
WO2004044025A2World Intellectual Property Organization (WIPO)A2
AU2003295517A1AustraliaA1
AU2003295517A8AustraliaA8
WO2004044025A3World Intellectual Property Organization (WIPO)A3
KR20040066124ARepublic of KoreaA
KR20040075866ARepublic of KoreaA
WO2004044025A8World Intellectual Property Organization (WIPO)A8
EP1472574A1European Patent Office (EPO)A1
EP1478682A1European Patent Office (EPO)A1
EP1478683A1European Patent Office (EPO)A1
US6824879B2United States of AmericaB2
TW200426199ATaiwan Province of ChinaA
US2005058929A1United States of AmericaA1
CN1606713AChinaA
JP2005509913AJapanA
JP2005509914AJapanA
JP2005512309AJapanA
WO2005037907A1World Intellectual Property Organization (WIPO)A1
KR20050042068ARepublic of KoreaA
KR20050042069ARepublic of KoreaA
CN1615332AChinaA
CN1615333AChinaA
KR20050044501ARepublic of KoreaA
EP1472574A4European Patent Office (EPO)A4
EP1478682A4European Patent Office (EPO)A4
EP1478683A4European Patent Office (EPO)A4
TW200526750ATaiwan Province of ChinaA
US6956097B2United States of AmericaB2
US2005245717A1United States of AmericaA1
US6969753B2United States of AmericaB2
US7012125B2United States of AmericaB2
KR20060097744ARepublic of KoreaA
KR20060131735ARepublic of KoreaA
US2007022909A1United States of AmericaA1
KR100705849B1Republic of KoreaB1
JP2007510761AJapanA
KR100804873B1Republic of KoreaB1
TW200833799ATaiwan Province of ChinaA
TWI304833BTaiwan Province of ChinaB
TWI308585BTaiwan Province of ChinaB
KR100897575B1Republic of KoreaB1
EP1190277B1European Patent Office (EPO)B1
AT445176TAustriaT
ATE445176T1This recordAustriaT1
DE60043105D1GermanyD1
JP2009282524AJapanA
JP4381143B2JapanB2
US7678462B2United States of AmericaB2
TWI324626BTaiwan Province of ChinaB
JP4703745B2JapanB2
CN1606713BChinaB
US8101015B2United States of AmericaB2
JP2012049548AJapanA
US2012070689A1United States of AmericaA1
US8344088B2United States of AmericaB2
US2013164677A1United States of AmericaA1
JP5348843B2JapanB2
TWI429721BTaiwan Province of ChinaB
US2014227538A1United States of AmericaA1
US8889334B2United States of AmericaB2
JP2015029110AJapanA
JP5674614B2JapanB2
US9069133B2United States of AmericaB2