ATE110795T1
Low temperature, plasma method of making plasma deposited coatings.
Abstract
This record has no abstract on file.
Term
Term ended
Projected expiry passed 14 December 2007, 18.8 years ago.
- Priority
- Filed
- Published
- Projected expiry
- Today
57 members in 17 offices
Priority claims1
| Document | Office | Kind | Date |
|---|---|---|---|
| 3226387 | United States of America | A |
Members57
| Document | Office | Kind | |
|---|---|---|---|
| IL69773D0 | Israel | D0 | |
| IE832238L | Ireland | L | |
| AU1938383A | Australia | A | |
| EP0104907A2 | European Patent Office (EPO) | A2 | |
| BR8305222A | Brazil | A | |
| JPS5978528A | Japan | A | |
| ZA837086B | South Africa | B | |
| EP0104907A3 | European Patent Office (EPO) | A3 | |
| KR840005915A | Republic of Korea | A | |
| ES8503453A1 | Spain | A1 | |
| ES8503892A1 | Spain | A1 | |
| US4504518A | United States of America | A | |
| US4517223A | United States of America | A | |
| EP0160365A1 | European Patent Office (EPO) | A1 | |
| AU3961485A | Australia | A | |
| JPS60231322A | Japan | A | |
| ZA851756B | South Africa | B | |
| ES541155A0 | Spain | A0 | |
| ES8602974A1 | Spain | A1 | |
| EP0175223A1 | European Patent Office (EPO) | A1 | |
| BR8501075A | Brazil | A | |
| IL69773A | Israel | A | |
| US4615905A | United States of America | A | |
| PH20277A | Philippines | A | |
| CA1219240A | Canada | A | |
| AU560168B2 | Australia | B2 | |
| US4664937A | United States of America | A | |
| EP0104907B1 | European Patent Office (EPO) | B1 | |
| AT27186T | Austria | T | |
| ATE27186T1 | Austria | T1 | |
| DE3371543D1 | Germany | D1 | |
| US4701343A | United States of America | A | |
| EG15981A | Egypt | A | |
| AU568192B2 | Australia | B2 | |
| IN161892B | India | B | |
| US4737379A | United States of America | A | |
| US4745000A | United States of America | A | |
| IN162992B | India | B | |
| EP0284693A2 | European Patent Office (EPO) | A2 | |
| JPS63262474A | Japan | A | |
| CA1248047A | Canada | A | |
| EP0284693A3 | European Patent Office (EPO) | A3 | |
| MX159170A | Mexico | A | |
| EP0160365B1 | European Patent Office (EPO) | B1 | |
| DE3570326D1 | Germany | D1 | |
| IE54688B1 | Ireland | B1 | |
| JPH0234911A | Japan | A | |
| KR910005370B1 | Republic of Korea | B1 | |
| JPH0419703B2 | Japan | B2 | |
| CA1325793C | Canada | C | |
| EP0284693B1 | European Patent Office (EPO) | B1 | |
| AT110795T | Austria | T | |
| ATE110795T1This record | Austria | T1 | |
| DE3750470D1 | Germany | D1 | |
| DE3750470T2 | Germany | T2 | |
| JP2579900B2 | Japan | B2 | |
| JP2648492B2 | Japan | B2 |
Numbers
- Application
- 87310966
Titles2
- English
- PLASMA METHOD FOR PRODUCING LAYERS PRODUCED BY PLASMA DISCHARGE AT LOW TEMPERATURE.
- German
- PLASMAVERFAHREN ZUR HERSTELLUNG MITTELS EINER PLASMAENTLADUNG HERGESTELLTER SCHICHTEN BEI NIEDRIGER TEMPERATUR.
Classification
- CPC, 12
- H01J37/32192
- C23C16/30
- C23C16/511
- H01J37/3222
- H01J37/32275
- B32B17/10018
- B32B2375/00
- H10P14/2901
- H10P14/2925
- H10P14/2922
- H10P14/24
- H10P14/3411
- IPC, 8
- C23C16 50
- C23C16 30
- C23C16 34
- C23C16 40
- C23C16 42
- C23C16 511
- H01J37 32
- H10P14 24