Nova Patents
AT542167T

Optical arrangement of autofocus elements for use with immersion lithography

Abstract

This record has no abstract on file.

Term

Term ended

Expired 12 April 2024, 2.5 years ago.

  1. Priority
  2. Filed
  3. Granted
  4. Expired
  5. Today

31 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims2

Priority claims
DocumentOfficeKindDate
46439203United States of AmericaP
2004011287United States of AmericaW

Members31

Family members, oldest first
DocumentOfficeKind
WO2004095135A2World Intellectual Property Organization (WIPO)A2
WO2004095135A3World Intellectual Property Organization (WIPO)A3
KR20050122269ARepublic of KoreaA
EP1614000A2European Patent Office (EPO)A2
US2006017900A1United States of AmericaA1
CN1774667AChinaA
JP2006523958AJapanA
US2007076303A1United States of AmericaA1
EP1614000A4European Patent Office (EPO)A4
US7414794B2United States of AmericaB2
SG152078A1SingaporeA1
US7570431B2United States of AmericaB2
US2009262322A1United States of AmericaA1
US2009317751A1United States of AmericaA1
JP2010093299AJapanA
US8018657B2United States of AmericaB2
US8094379B2United States of AmericaB2
EP1614000B1European Patent Office (EPO)B1
AT542167TThis recordAustriaT
ATE542167T1AustriaT1
US2012075609A1United States of AmericaA1
KR20120132694ARepublic of KoreaA
SG194246A1SingaporeA1
US8599488B2United States of AmericaB2
US2014055762A1United States of AmericaA1
KR101369582B1Republic of KoreaB1
US8810915B2United States of AmericaB2
US2014320833A1United States of AmericaA1
US8953250B2United States of AmericaB2
US2015109595A1United States of AmericaA1
US9086636B2United States of AmericaB2