Apparatus and method for controlled particle beam manufacturing of semiconductors

A method for performing a radiating the chamber includes the workpiece with charge particle: Charge particle source, for generating for particles stream; The collimator, which is along the axis collimation and electric conductive particles in a charge particle source,Methods digitizing apparatus arranged collimator downstream, which is along the axis vertical pitch between the electric conductive particles through the adjusting, forming a comprises at least charge particle the digital set of; Arranged on the connecting digitizing apparatus downstream the deflection reflector, wherein deflected the surface of a to the axis vertical is a series of deflecting electrode table, to deflect to the digital to diameter; And located at deflecting reflector's downstream workpiece table, wherein the workpiece and configuration for improving workpiece.