Niobium and vanadium organometallic precursors for thin film deposition

Type cp r1 is equal to 22 mm nr 2 nr3 compound: The: M is independently selected from vanadium nb v or the metal and m is less than or equal to 5; R1 is organic ligand each independently selected from h comprising from 1 to 6 carbon atoms a straight chain or branched alkyl; R2 is organic ligand each independently selected from h comprising from 1 to 6 carbon atoms a straight chain or branched alkyl; R3 is selected from h comprising from 1 to 6 carbon atoms a straight chain or branched alkyl organic ligand.