Nova Patents
AT534142T

Substrate dividing method

Abstract

A substrate dividing method which can thin and divide a substrate while preventing chipping and cracking from occurring. This substrate dividing method comprises the steps of irradiating a semiconductor substrate 1 having a front face 3 formed with functional devices 19 with laser light while positioning a light-converging point within the substrate, so as to form a modified region including a molten processed region due to multiphoton absorption within the semiconductor substrate 1, and causing the modified region including the molten processed region to form a starting point region for cutting; and grinding a rear face 21 of the semiconductor substrate 1 after the step of forming the startingpoint region for cutting such that the semiconductor substrate 1 attains a predetermined thickness.

Term

Term ended

Expired 6 March 2023, 3.6 years ago.

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Priority claims
DocumentOfficeKindDate
2002067289JapanA
2002067289JapanA
0302669JapanW
0302669JapanW
2002067289
0302669
JP20020067289
WO2003JP02669