Optical integrator for an illumination system of a microlithographic projection exposure apparatus

The device for manufacturing the irradiation system for microlithographic projection exposure device of long array's method, wherein the method comprises the following steps: a) provides a substrate (30); b) provides a switching the frame (24) cutting tool (22); a) is provided with a substrate (30) for redundant is arranged in the rapid cutting plate and tool (22) is released, and said to of the frame to be embedded with the substrate (30); d) a step c) is located on the micro the vertical direction (X) for roller of shaft of the substrate (30); e) at least one layer is vertical to the vertical direction (X) to the substrate (30); f) is repeatedly step c) and d).