Nova Patents
AT521613T

Hydrolysis resistant organomodified disiloxane surfactants

Abstract

The present invention is configured to include an asymmetric dimethyl siloxane surfactant composition comprising a silicone composition comprising a silicone having the formula MM ', over a wide pH range, indicating a resistance to hydrolysis as a composition, wherein, M or M 'is R13(C2H4O)a(C3H6O)b(C4H8O)cR14 And R12SiR5R6(R13(C2H4O)a(C3H6O)b(C4H8O)cR14) Alkyl, a polyalkylene oxide selected from the group consisting of retention (bearing) is constituted by a substituent.

Term

Projected expiry 6 October 2026.

  1. Priority
  2. Filed
  3. Granted
  4. Today
  5. Projected expiry

97 members in 16 offices

This recordMember, by publication datePriority claim6 more offices are in the list below

Priority claims4

Priority claims
DocumentOfficeKindDate
72640905United States of AmericaP
30010005United States of AmericaA
42791306United States of AmericaA
2006039206United States of AmericaW

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AU2006302235A1AustraliaA1
AU2006302363A1AustraliaA1
CA2625201A1CanadaA1
CA2625205A1CanadaA1
US2007086968A1United States of AmericaA1
US2007087937A1United States of AmericaA1
US2007088091A1United States of AmericaA1
WO2007044552A1World Intellectual Property Organization (WIPO)A1
WO2007044691A1World Intellectual Property Organization (WIPO)A1
US2007131610A1United States of AmericaA1
US2007131611A1United States of AmericaA1
US2007135308A1United States of AmericaA1
US2007135329A1United States of AmericaA1
AU2006326599A1AustraliaA1
CA2633934A1CanadaA1
WO2007070469A2World Intellectual Property Organization (WIPO)A2
CA2633907A1CanadaA1
WO2007089330A2World Intellectual Property Organization (WIPO)A2
WO2007089330A3World Intellectual Property Organization (WIPO)A3
WO2007070469A3World Intellectual Property Organization (WIPO)A3
WO2007133761A2World Intellectual Property Organization (WIPO)A2
WO2007133762A1World Intellectual Property Organization (WIPO)A1
TW200803968ATaiwan Province of ChinaA
TW200804484ATaiwan Province of ChinaA
KR20080047452ARepublic of KoreaA
KR20080058386ARepublic of KoreaA
WO2007133761A3World Intellectual Property Organization (WIPO)A3
AR060893A1ArgentinaA1
AR060894A1ArgentinaA1
EP1951732A1European Patent Office (EPO)A1
EP1951733A1European Patent Office (EPO)A1
KR20080076948ARepublic of KoreaA
KR20080077188ARepublic of KoreaA
EP1971205A2European Patent Office (EPO)A2
EP1973402A2European Patent Office (EPO)A2
CN101341156AChinaA
CN101341157AChinaA
CN101370378AChinaA
CN101370379AChinaA
ZA200803105BSouth AfricaB
ZA200803106BSouth AfricaB
EP2035123A2European Patent Office (EPO)A2
EP2035124A1European Patent Office (EPO)A1
JP2009511710AJapanA
JP2009511712AJapanA
US7507775B2United States of AmericaB2
HK1122817AHong Kong, ChinaA
ZA200805085BSouth AfricaB
CN101511457AChinaA
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HK1126779AHong Kong, ChinaA
US7601680B2United States of AmericaB2
US2009259062A1United States of AmericaA1
ZA200805084BSouth AfricaB
RU2008118482ARussian FederationA
RU2008118484ARussian FederationA
US7645720B2United States of AmericaB2
RU2008128409ARussian FederationA
RU2008128421ARussian FederationA
US7652072B2United States of AmericaB2
US2010069279A1United States of AmericaA1
US2010069329A1United States of AmericaA1
US2010069546A1United States of AmericaA1
EP1951733B1European Patent Office (EPO)B1
NZ567428ANew ZealandA
NZ567429ANew ZealandA
AT514703TAustriaT
ATE514703T1AustriaT1
BRPI0617385A2BrazilA2
BRPI0617394A2BrazilA2
AU2006302235B2AustraliaB2
EP1951732B1European Patent Office (EPO)B1
US8008231B2United States of AmericaB2
AT521613TThis recordAustriaT
ATE521613T1AustriaT1
BRPI0619780A2BrazilA2
BRPI0619781A2BrazilA2
RU2436301C2Russian FederationC2
RU2436303C2Russian FederationC2
US8183317B2United States of AmericaB2
CN101341156BChinaB
AU2006302363B2AustraliaB2
CN101511457BChinaB
AU2006326599B2AustraliaB2
CN101341157BChinaB
US8461092B2United States of AmericaB2
US8491876B2United States of AmericaB2
CN101370379BChinaB
EP2705895A1European Patent Office (EPO)A1
CN101511458BChinaB
KR101406723B1Republic of KoreaB1
KR101472846B1Republic of KoreaB1
TWI470014BTaiwan Province of ChinaB
CN101370378BChinaB
BRPI0617385B1BrazilB1
JP5854576B2JapanB2
BRPI0619780A8BrazilA8