Atomic layer deposition methods

Enables the first forerunner gas to flow to the substrate, wherein effectively; the substrate form the first single. The indoor of the lower surface microwave plasma state, enabled the conducting to flow to the indoor first single the first forerunner gas different second forerunner gas, wherein a which is connected with the first single reaction effectively; the substrate form the second single, wherein the form of the second single with the first single is different. The second single layer comprises a single first and second forerunner gas component. In one embodiment, the tandem duplication the first and an of the second forerunner gas, wherein the effectively material is arranged on the substrate are formed with the second single a massively. The connectors and manner of motor vehicle.