AT475200T

Floating gate memory cells with increased coupling ratio

Abstract

A a cylindrical flotation grid non-volatile semiconductor device control grid (18) and flotation grid (14) between the coupling rate method. The floats of the laminated grid of this invention the gate transistor, a conductive gap layer (24) is in overlapping two sides. Optimized with the aid of conductive layer (34) conductive gap layer (24) connected current control grid (18), further (22) and floating gate (14) which wherein the aid of the insulating layer. The conductive gap layer (24) and capacitor and grid (14) side (C1, C2) is a control grid (18) and flotation grid (14) between the normal capacitor.

Term

No projected expiry on record.

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14 members in 9 offices

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Priority claims
DocumentOfficeKindDate
02076771European Patent Office (EPO)A
0301485International Bureau of the World Intellectual Property Organization (WIPO)W

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DocumentOfficeKind
AU2003216649A1AustraliaA1
WO03096431A1World Intellectual Property Organization (WIPO)A1
TW200405578ATaiwan Province of ChinaA
EP1506580A1European Patent Office (EPO)A1
CN1653621AChinaA
JP2005524994AJapanA
US2005218445A1United States of AmericaA1
US7045852B2United States of AmericaB2
TWI306312BTaiwan Province of ChinaB
CN100533772CChinaC
EP1506580B1European Patent Office (EPO)B1
AT475200TThis recordAustriaT
ATE475200T1AustriaT1
DE60333452D1GermanyD1