Nova Patents
AT458555T

Over-clocking in a microdeposition control system to improve resolution

Abstract

This record has no abstract on file.

Term

Term ended

Expired 31 May 2022, 4.3 years ago.

  1. Priority
  2. Filed
  3. Granted
  4. Expired
  5. Today

98 members in 9 offices

This recordMember, by publication datePriority claim

Priority claims3

Priority claims
DocumentOfficeKindDate
29510001United States of AmericaP
29511801United States of AmericaP
0217521United States of AmericaW

Members98

Family members, oldest first
DocumentOfficeKind
WO02098573A1World Intellectual Property Organization (WIPO)A1
WO02098574A1World Intellectual Property Organization (WIPO)A1
WO02098575A1World Intellectual Property Organization (WIPO)A1
WO02098576A1World Intellectual Property Organization (WIPO)A1
WO02099848A2World Intellectual Property Organization (WIPO)A2
WO02099849A2World Intellectual Property Organization (WIPO)A2
WO02099850A2World Intellectual Property Organization (WIPO)A2
WO02099851A2World Intellectual Property Organization (WIPO)A2
AU2002314894A1AustraliaA1
AU2002346735A1AustraliaA1
AU2002346738A1AustraliaA1
AU2002346740A1AustraliaA1
WO02099850A3World Intellectual Property Organization (WIPO)A3
WO02099848A3World Intellectual Property Organization (WIPO)A3
WO02099851A3World Intellectual Property Organization (WIPO)A3
EP1392449A1European Patent Office (EPO)A1
KR20040024558ARepublic of KoreaA
EP1399267A1European Patent Office (EPO)A1
EP1399268A1European Patent Office (EPO)A1
EP1399269A1European Patent Office (EPO)A1
EP1399950A2European Patent Office (EPO)A2
EP1399951A2European Patent Office (EPO)A2
KR20040026659ARepublic of KoreaA
KR20040029997ARepublic of KoreaA
KR20040037027ARepublic of KoreaA
KR20040037028ARepublic of KoreaA
KR20040038914ARepublic of KoreaA
KR20040038915ARepublic of KoreaA
CN1512917AChinaA
CN1512918AChinaA
CN1512919AChinaA
US2004173144A1United States of AmericaA1
JP2004528978AJapanA
CN1535185AChinaA
CN1535186AChinaA
JP2004530550AJapanA
JP2004533121AJapanA
JP2004535287AJapanA
US2004231593A1United States of AmericaA1
US2004231594A1United States of AmericaA1
US2004238522A1United States of AmericaA1
US2004261700A1United States of AmericaA1
US2005000422A1United States of AmericaA1
JP2005501691AJapanA
JP2005502447AJapanA
US2005016451A1United States of AmericaA1
JP2005515052AJapanA
CN1630939AChinaA
CN1635949AChinaA
WO02099849A3World Intellectual Property Organization (WIPO)A3
EP1392449A4European Patent Office (EPO)A4
EP1399267A4European Patent Office (EPO)A4
EP1399268A4European Patent Office (EPO)A4
EP1399269A4European Patent Office (EPO)A4
EP1399950A4European Patent Office (EPO)A4
EP1399951A4European Patent Office (EPO)A4
EP1569757A2European Patent Office (EPO)A2
AU2002346738A8AustraliaA8
CN1274425CChinaC
CN1280025CChinaC
US2006251796A1United States of AmericaA1
EP1569757A4European Patent Office (EPO)A4
CN1285420CChinaC
CN1289207CChinaC
US7160105B2United States of AmericaB2
US7244310B2United States of AmericaB2
CN1329130CChinaC
US7270712B2United States of AmericaB2
US7449070B2United States of AmericaB2
US2009029069A1United States of AmericaA1
KR100882520B1Republic of KoreaB1
JP2009113040AJapanA
JP2009136871AJapanA
KR100912008B1Republic of KoreaB1
JP4328614B2JapanB2
KR20090106424ARepublic of KoreaA
JP4342301B2JapanB2
JP4342302B2JapanB2
JP4342303B2JapanB2
KR100924002B1Republic of KoreaB1
KR100938810B1Republic of KoreaB1
EP1392449B1European Patent Office (EPO)B1
AT458555TThis recordAustriaT
ATE458555T1AustriaT1
DE60235458D1GermanyD1
US7757632B2United States of AmericaB2
EP1399267B1European Patent Office (EPO)B1
EP1399269B1European Patent Office (EPO)B1
AT486662TAustriaT
AT486663TAustriaT
ATE486662T1AustriaT1
ATE486663T1AustriaT1
KR100998171B1Republic of KoreaB1
DE60238189D1GermanyD1
DE60238190D1GermanyD1
JP4880708B2JapanB2
EP1399268B1European Patent Office (EPO)B1
JP5145259B2JapanB2