AT450595T

Cleaning compositions for microelectronics substrates

Abstract

The invention relates to the tripping and cleaning composition for cleaning the electronic substrate, said composition comprising: At least one organic solvent process, at least one of nucleophilic alkane alcohol, wherein at least one of a thereof, wherein amount sufficient and about 3 wt %~ about 75 weight percent nucleophilic alkane alcohol, wherein the composition tripping the water phase pH of about 9.6~ about 10.9, wherein weak acid pK value is aqueous solution is 2.0 and greater than the equivalent weight of less than 140, at least one of removing metal compound selected from diglycol and diglycol amine, and water, and using these composition for cleaning substrate with a method.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

26 members in 18 offices

This recordMember, by publication datePriority claim8 more offices are in the list below

Priority claims2

Priority claims
DocumentOfficeKindDate
59831804United States of AmericaP
2005022598United States of AmericaW

Members26

Family members, oldest first
DocumentOfficeKind
TW200606249ATaiwan Province of ChinaA
CA2575991A1CanadaA1
WO2006023061A1World Intellectual Property Organization (WIPO)A1
NO20071196LNorwayL
KR20070045224ARepublic of KoreaA
EP1789527A1European Patent Office (EPO)A1
CN1993457AChinaA
IL181106A0IsraelA0
IL181106D0IsraelD0
US2008051308A1United States of AmericaA1
JP2008509554AJapanA
BRPI0514058ABrazilA
ZA200700653BSouth AfricaB
EP1789527B1European Patent Office (EPO)B1
AT450595TThis recordAustriaT
ATE450595T1AustriaT1
DE602005018075D1GermanyD1
PT1789527EPortugalE
DK1789527T3DenmarkT3
ES2335786T3SpainT3
JP4625842B2JapanB2
MY144284AMalaysiaA
US8178482B2United States of AmericaB2
KR101162797B1Republic of KoreaB1
CN1993457BChinaB
TWI390032BTaiwan Province of ChinaB