Cleaning compositions for microelectronics substrates
Abstract
The invention relates to the tripping and cleaning composition for cleaning the electronic substrate, said composition comprising: At least one organic solvent process, at least one of nucleophilic alkane alcohol, wherein at least one of a thereof, wherein amount sufficient and about 3 wt %~ about 75 weight percent nucleophilic alkane alcohol, wherein the composition tripping the water phase pH of about 9.6~ about 10.9, wherein weak acid pK value is aqueous solution is 2.0 and greater than the equivalent weight of less than 140, at least one of removing metal compound selected from diglycol and diglycol amine, and water, and using these composition for cleaning substrate with a method.
Term
No projected expiry on record.
- Priority
- Filed
- Granted
- Today
26 members in 18 offices
Priority claims2
| Document | Office | Kind | Date |
|---|---|---|---|
| 59831804 | United States of America | P | |
| 2005022598 | United States of America | W |
Members26
| Document | Office | Kind | |
|---|---|---|---|
| TW200606249A | Taiwan Province of China | A | |
| CA2575991A1 | Canada | A1 | |
| WO2006023061A1 | World Intellectual Property Organization (WIPO) | A1 | |
| NO20071196L | Norway | L | |
| KR20070045224A | Republic of Korea | A | |
| EP1789527A1 | European Patent Office (EPO) | A1 | |
| CN1993457A | China | A | |
| IL181106A0 | Israel | A0 | |
| IL181106D0 | Israel | D0 | |
| US2008051308A1 | United States of America | A1 | |
| JP2008509554A | Japan | A | |
| BRPI0514058A | Brazil | A | |
| ZA200700653B | South Africa | B | |
| EP1789527B1 | European Patent Office (EPO) | B1 | |
| AT450595TThis record | Austria | T | |
| ATE450595T1 | Austria | T1 | |
| DE602005018075D1 | Germany | D1 | |
| PT1789527E | Portugal | E | |
| DK1789527T3 | Denmark | T3 | |
| ES2335786T3 | Spain | T3 | |
| JP4625842B2 | Japan | B2 | |
| MY144284A | Malaysia | A | |
| US8178482B2 | United States of America | B2 | |
| KR101162797B1 | Republic of Korea | B1 | |
| CN1993457B | China | B | |
| TWI390032B | Taiwan Province of China | B |
2 legal events, as the office reported them to INPADOC
Over the term
Point at a mark for the eventEvents
| Event | Code | |
|---|---|---|
| Change of the company nameEEFA | EEFA | |
| Publication of translation of european patent specificationUEP | UEP |
Numbers
- Application
- 5776485
Titles2
- German
- REINIGUNGSMITTEL FÜR MIKROELEKTRONIK-SUBSTRATE
- English
- CLEANING AGENT FOR MICROELECTRONIC SUBSTRATE
Classification
- CPC, 17
- G03F7/426
- C11D3/20
- C11D3/2058
- C11D3/2068
- C11D3/2075
- C11D3/30
- C11D3/43
- C11D7/263
- C11D7/265
- C11D7/3218
- C11D7/3227
- C11D7/5009
- C11D7/5013
- C11D11/0047
- G03F7/425
- H05K3/26
- C11D7/32
- IPC, 8
- C11D11 00
- C11D3 20
- C11D3 30
- C11D3 43
- C11D7 26
- C11D7 32
- G03F7 42
- H05K3 26