AT445226T

Methods and apparatus for plasma doping and ion implantation in an integrated processing system

Abstract

This record has no abstract on file.

Term

Term ended

Expired 17 October 2022, 3.9 years ago.

  1. Priority
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  3. Granted
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17 members in 10 offices

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Priority claims
DocumentOfficeKindDate
753001United States of AmericaA
0233091United States of AmericaW

Members17

Family members, oldest first
DocumentOfficeKind
US2003082891A1United States of AmericaA1
WO03038879A2World Intellectual Property Organization (WIPO)A2
WO03038879A3World Intellectual Property Organization (WIPO)A3
TW582061BTaiwan Province of ChinaB
US6716727B2United States of AmericaB2
KR20040054745ARepublic of KoreaA
EP1438734A2European Patent Office (EPO)A2
CN1592944AChinaA
JP2005508088AJapanA
CN100407363CChinaC
KR100876049B1Republic of KoreaB1
EP1438734B1European Patent Office (EPO)B1
AT445226TThis recordAustriaT
ATE445226T1AustriaT1
DE60233956D1GermanyD1
ES2333782T3SpainT3
JP4587364B2JapanB2