AT440376T
Processing system and method for thermally treating a substrate
Abstract
[Subject] The processing system and method for processing a substrate thermally. [Solution means] It is the processing system and method for processing a substrate thermally, and this processing system is equipped with the thermal processing chamber by which temperature control is carried out, and the substrate holder by which the temperature for supporting a substrate to heat treatment is controlled. This substrate holder is insulated from a heat treatment chamber.
Term
No projected expiry on record.
- Priority
- Filed
- Granted
- Today
2 priority claims, no other members on record
Priority claims2
| Document | Office | Kind | Date |
|---|---|---|---|
| 45464103 | United States of America | P | |
| 2004007866 | United States of America | W |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Ceased as to paragraph 5 lit. 3 law introducing patent treatiesCeasedRER | RER |
Numbers
- Application
- 4757456
Titles2
- German
- VERARBEITUNGSSYSTEM UND VERFAHREN ZUM THERMISCHEN BEHANDELN EINES SUBSTRATS
- English
- PROCESSING SYSTEM AND METHOD FOR THE THERMAL TREATMENT OF A SUBSTRATE
Classification
- CPC, 10
- H01L21/67748
- C23C16/4405
- C25D11/02
- H01L21/67069
- H01L21/67103
- H01L21/67109
- H01L21/67126
- H01L21/67207
- H01L21/67248
- H01L21/67253
- IPC, 4
- C23C16 44
- C25D11 02
- H01L21 00
- H01L21 677