Methods for fabrication of nanometer-scale engineered structures for mask repair application

Using writing with a repairing and manufacturing photo mask directly, comprising: Using scanning probe microscopy insulating a size of deposition gel of the metal oil ink material. Increasing method of with the subtracting to a method. Can use the nano structure of a filling nozzle. A control of the opening hole of the nano structure height; and two said of the control measuring structure. Can use and made on the glass the chrome cover, and more improved cover, comprising mask for nanoimprinting full with a.