AT415687T

Substrate electron injection techniques for programming non-volatile charge storage memory cells

Abstract

The invention claims a programming technology for quick flash storage, wherein the programming technology to make the electronic to pour of the substrate storage location charging storage battery. A along the common word and wire or this control gate line by exerting to the diameter of the voltage programming storage location source area and connected with the electric suspended with, and programmed storage location source reflecting drain electrode region provided with a voltage of exerting. The programming technology applied to a NOR or an NAND structure and storage location array.

Term

No projected expiry on record.

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19 members in 9 offices

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Priority claims
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2119304United States of AmericaA

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US6980471B1United States of AmericaB1
US2006139998A1United States of AmericaA1
TW200623137ATaiwan Province of ChinaA
WO2006071282A1World Intellectual Property Organization (WIPO)A1
US7230847B2United States of AmericaB2
EP1829044A1European Patent Office (EPO)A1
US2007217264A1United States of AmericaA1
KR20070108143ARepublic of KoreaA
CN101120416AChinaA
JP2008525932AJapanA
US7443736B2United States of AmericaB2
EP1829044B1European Patent Office (EPO)B1
AT415687TThis recordAustriaT
ATE415687T1AustriaT1
JP4195906B2JapanB2
DE602005011333D1GermanyD1
CN100547687CChinaC
KR101018667B1Republic of KoreaB1
TWI391935BTaiwan Province of ChinaB