Ion source with substantially planar design
Abstract
An ion source comprising: a conductive cathode comprising an inner cathode portion (5a) and a portion of outer cathode (5b) in a given plane; a hollow ion emission (22) at least partially formed between the part of inner cathode and the portion of outer cathode, which includes an inner periphery defined by the periphery of the inner cathode (5a) and an outer periphery defined the inner periphery of the outer cathode portion (5b); an anode (25) located between the inner cathode portion (5a) and the outer cathode portion (5b) seen perpendicularly from above and / or below the given plane; characterized in that no part of the portion of inner cathode (5a) protrudes above the anode (25), and no part of the portion of outer cathode (5b) protrudes above the anode (25) seen perpendicularly from above and / or below the given plane.
Term
No projected expiry on record.
- Priority
- Filed
- Granted
- Today
13 members in 8 offices
Priority claims1
| Document | Office | Kind | Date |
|---|---|---|---|
| 98645604 | United States of America | A |
Members13
| Document | Office | Kind | |
|---|---|---|---|
| US2006103319A1 | United States of America | A1 | |
| WO2006055296A2 | World Intellectual Property Organization (WIPO) | A2 | |
| CA2585176A1 | Canada | A1 | |
| WO2006055296A3 | World Intellectual Property Organization (WIPO) | A3 | |
| US7183559B2 | United States of America | B2 | |
| EP1825491A2 | European Patent Office (EPO) | A2 | |
| EP1825491B1 | European Patent Office (EPO) | B1 | |
| AT409355TThis record | Austria | T | |
| ATE409355T1 | Austria | T1 | |
| DE602005009972D1 | Germany | D1 | |
| ES2313443T3 | Spain | T3 | |
| PL1825491T3 | Poland | T3 | |
| CA2585176C | Canada | C |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Ceased as to paragraph 5 lit. 3 law introducing patent treatiesCeasedRER | RER |
Numbers
- Application
- 5818170
Titles2
- German
- IONENQUELLE MIT IM WESENTLICHEN PLANARER AUSGESTALTUNG
- English
- ION SOURCE WITH ESSENTIALLY PLANAR DESIGN
Classification
- CPC, 3
- H01J37/08
- H01J3/04
- H01J27/143
- IPC, 3
- H01J27 14
- H01J3 04
- H01J37 08