Methods of depositing materials over substrates and methods of forming layers over substrates

The present invention includes the use of supercritical fluids to introduce precursors into the reaction chamber. In some aspects, a supercritical fluid is used to introduce at least one precursor into a chamber during ALD, a supercritical fluid is in a particular mode is used in order to introduce multiple precursors into the reaction chamber during ALD. The present invention is, for example, metal oxides, metal nitrides, such as metal-containing materials, including, and a material composed of a metal, may be used to form a variety of materials. Since the metal oxide on the surface of the metal substrate has a layer containing a precursor for forming a metal-containing can be used to introduce a second precursor into the reaction chamber may be formed by using a supercritical fluid. Subsequently, the metal-containing layer is at least a part of the metal layer of the metal inside the reaction with oxygen may be converted to metal oxide.