Pattern generator using euv

Is a on the workpiece generating such as on the semiconductor wafer and a is provided with high resolution the device the invention relates to a. The device comprises is used for transmitting the EUV wavelength the electromagnetic radiation source, with a digital indicating of the multiple image space element modulator (SLM), and is extended towards reader, a withdraw minute pointer the sequence, the minute pointer to the conversion modulator and signal transforming the input and electronic data - processing and transmitting system for modulator, which is used to each other is equipped with the workpiece and/or projection system of mechanical related system. Further - comprising a workpiece the internal, and is matched to the modulator and signal and radiating in turn minute pointer image to suture on a same base is provided with a pattern the electronic control system.