Nova Patents
AT376201T

Stripping and cleaning compositions for microelectronics

Abstract

An aqueous composition for cleaning microelectronic substrates and minimizing aluminum corrosion, the composition comprising (1) water and (2) at least one of (a) hypophosphite ammonium (b) phosphite ammonium, or (c) hypophosphorous acid or phosphorous acid and an ammonium salt.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

26 members in 18 offices

This recordMember, by publication datePriority claim8 more offices are in the list below

Priority claims2

Priority claims
DocumentOfficeKindDate
49611003United States of AmericaP
54897604United States of AmericaP

Members26

Family members, oldest first
DocumentOfficeKind
CA2536159A1CanadaA1
WO2005019939A1World Intellectual Property Organization (WIPO)A1
TW200536936ATaiwan Province of ChinaA
NO20061247LNorwayL
EP1664935A1European Patent Office (EPO)A1
KR20060076764ARepublic of KoreaA
IL173664D0IsraelD0
US2006154839A1United States of AmericaA1
CN1839355AChinaA
BRPI0413657ABrazilA
JP2007503115AJapanA
EP1664935B1European Patent Office (EPO)B1
AT376201TThis recordAustriaT
DE602004009595D1GermanyD1
PT1664935EPortugalE
DK1664935T3DenmarkT3
PL1664935T3PolandT3
ES2293340T3SpainT3
DE602004009595T2GermanyT2
MY139624AMalaysiaA
JP4522408B2JapanB2
IL173664AIsraelA
US7928046B2United States of AmericaB2
KR101056544B1Republic of KoreaB1
TWI354020BTaiwan Province of ChinaB
CN1839355BChinaB