Nova Patents
AT374168T

Method for depositing gallium oxide coatings on flat glass

Abstract

The invention claims a wherein the organic ester and inorganic forming gallium comprising the chemical vapour deposition method of gallium oxide coating on the glass substrate. Wherein the organic group is a 3-6 carbon atoms, is helpful to obtain the high settling rate. A wherein the chemical vapour deposition method of gallium oxide coating preferably is under normal pressure is. Is obtainable by high deposition rate, therefore the obtained product according to claim considerable the thickness of gallium coating. The invention using the coating is preferably is greater than or equal to 75  and/or second.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

13 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims1

Priority claims
DocumentOfficeKindDate
79745004United States of AmericaA

Members13

Family members, oldest first
DocumentOfficeKind
US2005202170A1United States of AmericaA1
WO2005092809A1World Intellectual Property Organization (WIPO)A1
EP1725504A1European Patent Office (EPO)A1
KR20070012647ARepublic of KoreaA
CN1930099AChinaA
US7223441B2United States of AmericaB2
EP1725504B1European Patent Office (EPO)B1
JP2007528445AJapanA
AT374168TThis recordAustriaT
DE602005002635D1GermanyD1
DE602005002635T2GermanyT2
CN1930099BChinaB
JP4757862B2JapanB2