AT371708T
Silane containing polishing composition for CMP
Abstract
A method for the polishing composition, comprising at least one solution of alkoxyhydrosilane compound and at least one abradant, wherein the is the substrate of the surface.
Term
No projected expiry on record.
- Priority
- Filed
- Granted
- Today
15 members in 9 offices
Priority claims1
| Document | Office | Kind | Date |
|---|---|---|---|
| 60948000 | United States of America | A |
Members15
| Document | Office | Kind | |
|---|---|---|---|
| WO0202707A1 | World Intellectual Property Organization (WIPO) | A1 | |
| AU6984101A | Australia | A | |
| EP1299490A1 | European Patent Office (EPO) | A1 | |
| CN1440449A | China | A | |
| US6646348B1 | United States of America | B1 | |
| JP2004502824A | Japan | A | |
| US2004214443A1 | United States of America | A1 | |
| CN1249185C | China | C | |
| TWI279426B | Taiwan Province of China | B | |
| EP1299490B1 | European Patent Office (EPO) | B1 | |
| AT371708TThis record | Austria | T | |
| DE60130213D1 | Germany | D1 | |
| EP1852481A1 | European Patent Office (EPO) | A1 | |
| DE60130213T2 | Germany | T2 | |
| EP1852481B1 | European Patent Office (EPO) | B1 |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Ceased as to paragraph 5 lit. 3 law introducing patent treatiesCeasedRER | RER |
Numbers
- Application
- 1948384
Titles2
- German
- SILANHALTIGE POLIERZUSAMMENSETZUNG FÜR CMP
- English
- SILANOUS POLISHING COMPOSITION FOR CMP
Classification
- CPC, 4
- C09G1/02
- C09K3/1463
- C09K3/1472
- H01L21/3212
- IPC, 5
- B24B37 00
- C09G1 02
- C09K3 14
- H01L21 304
- H01L21 321