Method and apparatus for treating a substrate

The method for processing at least a surface, wherein at least a light flexible of the processing chamber, the pressure of the processing chamber is relatively low, and shot of the source to produce the plasma at least plasma, or processing, wherein the plasma is the source (3) and/or at least one of on the treatment liquid supply source to the substrate surface of the motion. The invention further relates to a method for treating at least a surface, wherein the device is provided with the processing chamber and at least one plasma is the source, wherein at least plasma is the source (3) and/or at least one of on the treatment liquid supply source of the carrier which is.