Polymeric compositions and uses therefore

The invention relates to polyepoxide, the production method of polyepoxide, and for use as a process for manufacturing the circuit the application method. A separate an embodiment, the present invention relates to the photoresist composition according at least one halogenide polycyclic monomer or hydrogen polycyclic polymerizing monomer is formed. The other of solution, invention relates to a at least one halogenide polycyclic monomer or hydrogen polycyclic bound to at least one of the photoresist composition according the halogenide of polyepoxide copolymer formed. , And the invention further relates to the photoresist composition for performing the treatment in order to obtain is one or more of: (1) By the polymer composition of optical density; A (2) by a polymer composition the content of residual metal and/or monomer. Moreover, the invention is also disclosed is a method for producing the invention photoresist composition according the catalyst system, wherein the catalyst system to control the photoresist product the molecular weight.