Method for obtaining a mark on a low surface energy ophthalmic lens

The present invention relates to the method of carrying out mark attachment of the off-サルミック lens which has the low surface energy outer layer of hydrophobicity and (or) 撥油性 -ed 着 (ed) by the high surface energy base material or the tunic. This method consists of the process positioned between the sources of 付勢 type electric discharge which can lose an outer layer substantially so that the lens surface by which mark attachment should be carried out in the complementary-like pattern attachment mask of a desired mark, and the high surface energy base material or tunic located downward may be exposed. A temporary protection layer has surface energy higher than an outer layer, thickness is about 5 nm or less, it is 2*4 nm preferably, and electric discharge enables it to act on an outer layer through a temporary protection layer by that cause.