Nova Patents
AT352048T

Exposure apparatus comprising an optical element made of an isometric crystal

Abstract

The present invention provides a method for manufacturing an optical element and its manufacturing method, an exposure apparatus and device that can reduce the influence of birefringence under a potential high NA conditions. According to an aspect of the invention, the axis of the cubic crystal of [0 0 1] and the angle is less than 10 ° between the optical axis and preferably from 0 °.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

16 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims2

Priority claims
DocumentOfficeKindDate
2001234254JapanA
2001244970JapanA

Members16

Family members, oldest first
DocumentOfficeKind
US2003000453A1United States of AmericaA1
WO03003072A2World Intellectual Property Organization (WIPO)A2
JP2003131002AJapanA
WO03003072A3World Intellectual Property Organization (WIPO)A3
KR20040015179ARepublic of KoreaA
EP1399766A2European Patent Office (EPO)A2
US2004136084A1United States of AmericaA1
JP3639807B2JapanB2
TWI244679BTaiwan Province of ChinaB
KR100544394B1Republic of KoreaB1
US7102828B2United States of AmericaB2
EP1399766B1European Patent Office (EPO)B1
AT352048TThis recordAustriaT
DE60217673D1GermanyD1
US7262920B2United States of AmericaB2
DE60217673T2GermanyT2