Silicon wafer with embedded optoelectronic material for monolithic oeic

It is the structure of having the optical activity layer embedded to Si wafer, and the epitaxial layer of the outside exposed to CMOS processing equipment always serves as material corresponding to CMOS, such as Si or other SiO (s). Since the photoelectron layer is completely enclosed by Si, a wafer fully corresponds to standard SiCMOS manufacture. Since it is transparent, Si completely to the wavelength of a light longer than the band gap (1.1 micrometers) of Si a light signal, Between an embedding photoelectron layer and external 導波路 can be penetrated using either the usual incidence (Si board or a top Si cap layer is passed) or the incidence within a field (end combination).