Nova Patents
AT346377T

Rhodium-rich oxygen barriers

Abstract

The invention claims a forming integrated - circuits capacitor structure and method. The capacitor comprises rich rhodium structure (24), a rhodium oxide layer of rich rhodium structure (24) directly (26), a rhodium oxide layer (26) directly contacted capacitor dielectric (30) and electrode (40) is capacitor. The rich rhodium structure (24) can (30) is a high dielectric constant comprising a rhodium alloy and capacitor dielectric.

Term

No projected expiry on record.

  1. Priority
  2. Filed
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23 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims1

Priority claims
DocumentOfficeKindDate
78933501United States of AmericaA

Members23

Family members, oldest first
DocumentOfficeKind
US2002113260A1United States of AmericaA1
WO02067302A2World Intellectual Property Organization (WIPO)A2
US2002190303A1United States of AmericaA1
US6518610B2United States of AmericaB2
US2003102501A1United States of AmericaA1
WO02067302A3World Intellectual Property Organization (WIPO)A3
KR20030088433ARepublic of KoreaA
EP1368822A2European Patent Office (EPO)A2
US6740554B2United States of AmericaB2
WO02067302A8World Intellectual Property Organization (WIPO)A8
CN1518758AChinaA
US6781175B2United States of AmericaB2
JP2004532512AJapanA
US2004212002A1United States of AmericaA1
US7038263B2United States of AmericaB2
KR100610303B1Republic of KoreaB1
EP1368822B1European Patent Office (EPO)B1
AT346377TThis recordAustriaT
ATE346377T1AustriaT1
DE60216241D1GermanyD1
DE60216241T2GermanyT2
CN100373543CChinaC
JP4399521B2JapanB2