Nova Patents
AT346375T

RF powered plasma enhanced chemical vapour deposition reactor and methods of effecting plasma enhanced chemical vapour deposition

Abstract

This record has no abstract on file.

Term

Term ended

Expired 16 February 2019, 7.6 years ago.

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23 members in 9 offices

This recordMember, by publication datePriority claim

Priority claims1

Priority claims
DocumentOfficeKindDate
2604298United States of AmericaA

Members23

Family members, oldest first
DocumentOfficeKind
WO9943018A1World Intellectual Property Organization (WIPO)A1
AU2767499AAustraliaA
EP1057205A1European Patent Office (EPO)A1
US6159867AUnited States of AmericaA
US6235646B1United States of AmericaB1
US2001003270A1United States of AmericaA1
KR20010086231ARepublic of KoreaA
TW460606BTaiwan Province of ChinaB
JP2002504749AJapanA
US2002056416A1United States of AmericaA1
US2002061656A1United States of AmericaA1
US6395128B2United States of AmericaB2
US6533894B2United States of AmericaB2
KR100388530B1Republic of KoreaB1
US6705246B2United States of AmericaB2
JP3527201B2JapanB2
EP1057205B1European Patent Office (EPO)B1
AT346375TThis recordAustriaT
ATE346375T1AustriaT1
DE69934101D1GermanyD1
EP1764822A2European Patent Office (EPO)A2
DE69934101T2GermanyT2
EP1764822A3European Patent Office (EPO)A3