Nova Patents
AT340996T

Process of using a sensor platform

Abstract

A sensor platform for sample analysis, including refractive (N1) substrates (30) and a form in the thin, optically transparent layer on the substrate (32), its refractive index (N2) is greater than the index of refraction (N1). The platform consists of one or more of the cyclical grooves (31), (33) forms of corrugation structure, qualify one or more sensor areas, each sensitive area corresponds to one or more of the capture component. The Groove is assigned to a certain shape, size and orientation, so when coherent light incident on the platform, be diffraction and diffraction beam or into individual-level, leading to decrease of transmitted beam and abnormally high reflection of incident light, which produced at each surface of the sensing area increased rapidly. Resonance amplitude of the field than the existing technology platform increases the magnitude of approximately 100, made from the platform was more samples on the luminous intensity of a factor of 100 times. Also exposes a device equipped with the platform and ways to use that platform.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

33 members in 15 offices

This recordMember, by publication datePriority claim5 more offices are in the list below

Priority claims2

Priority claims
DocumentOfficeKindDate
9915703United KingdomA
0011420United KingdomA

Members33

Family members, oldest first
DocumentOfficeKind
GB9915703D0United KingdomD0
GB0011420D0United KingdomD0
WO0102839A1World Intellectual Property Organization (WIPO)A1
AU5824300AAustraliaA
KR20020019473ARepublic of KoreaA
EP1192448A1European Patent Office (EPO)A1
CN1369059AChinaA
US2002135780A1United States of AmericaA1
HK1046438A1Hong Kong, ChinaA1
JP2003503732AJapanA
US6707561B1United States of AmericaB1
US2004115825A1United States of AmericaA1
US2004115826A1United States of AmericaA1
US6771376B2United States of AmericaB2
US6867869B2United States of AmericaB2
US6870630B2United States of AmericaB2
US2005117161A1United States of AmericaA1
US7064844B2United States of AmericaB2
EP1192448B1European Patent Office (EPO)B1
US2006216204A1United States of AmericaA1
AT340996TThis recordAustriaT
ATE340996T1AustriaT1
DE60030978D1GermanyD1
DK1192448T3DenmarkT3
PT1192448EPortugalE
HK1046438BHong Kong, ChinaB
ES2273704T3SpainT3
DE60030978T2GermanyT2
CN100397068CChinaC
KR100883079B1Republic of KoreaB1
US7820106B2United States of AmericaB2
JP4684507B2JapanB2
CY1107541T1CyprusT1