AT333668T
High luminosity source for EUV lithography
Abstract
This record has no abstract on file.
Term
No projected expiry on record.
- Priority
- Filed
- Granted
- Today
14 members in 7 offices
Priority claims4
| Document | Office | Kind | Date |
|---|---|---|---|
| 2001380646 | Japan | A | |
| 2001380646 | Japan | A | |
| 2001380646 | – | – | – |
| JP20010380646 | – | – | – |
Members14
| Document | Office | Kind | |
|---|---|---|---|
| EP1319988A2 | European Patent Office (EPO) | A2 | |
| KR20030051206A | Republic of Korea | A | |
| JP2003185798A | Japan | A | |
| TW200302492A | Taiwan Province of China | A | |
| US2003223544A1 | United States of America | A1 | |
| EP1319988A3 | European Patent Office (EPO) | A3 | |
| US6861656B2 | United States of America | B2 | |
| EP1319988B1 | European Patent Office (EPO) | B1 | |
| AT333668TThis record | Austria | T | |
| ATE333668T1 | Austria | T1 | |
| DE60213187D1 | Germany | D1 | |
| DE60213187T2 | Germany | T2 | |
| TWI287236B | Taiwan Province of China | B | |
| KR100895227B1 | Republic of Korea | B1 |
1 legal event, as the office reported them to INPADOC
Events
| Event | Code | |
|---|---|---|
| Ceased as to paragraph 5 lit. 3 law introducing patent treatiesCeasedRER | RER |
Numbers
- Publication, DOCDB
- 333668
- Publication, EPODOC
- AT333668T
- Application
- 2258588
- Application, DOCDB
- 02258588
- Application, EPODOC
- AT20020258588T
Titles2
- German
- STRAHLUNGSQUELLE HOHER LUMINOSITÄT FÜR DIE EUV- LITHOGRAPHIE
- English
- RADIATION SOURCE OF HIGH LUMINOSITY FOR EUV LITHOGRAPHY
Classification
- CPC, 5
- B82Y10/00
- H01L21/027
- G03F7/70033
- G03F7/7005
- G03F7/70058
- IPC, 5
- G21K1 06
- G03F7 20
- G21K5 02
- H01L21 027
- H05G2 00