Nova Patents
AT324599T

Antireflection film

Abstract

The device comprises reflecting composite material, substrate and deposition inorganic material layer product on the base plate. The substance inorganic levelling thickness is 1nm-10nm. The product comprising a inorganic material layer contact to form reflecting composite material outer surface layer of polymer. The polymer levelling thickness is 70nm-120nm.

Term

No projected expiry on record.

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78 members in 10 offices

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Priority claims
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57174200United States of AmericaA

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WO9942860A1World Intellectual Property Organization (WIPO)A1
WO0031570A1World Intellectual Property Organization (WIPO)A1
EP1057048A1European Patent Office (EPO)A1
KR20010072551ARepublic of KoreaA
WO0188572A2World Intellectual Property Organization (WIPO)A2
AU5932801AAustraliaA
US2001049024A1United States of AmericaA1
JP2002504697AJapanA
WO0212404A2World Intellectual Property Organization (WIPO)A2
WO0212857A1World Intellectual Property Organization (WIPO)A1
WO0213224A2World Intellectual Property Organization (WIPO)A2
AU2939501AAustraliaA
AU8114101AAustraliaA
AU8120201AAustraliaA
WO0212404A3World Intellectual Property Organization (WIPO)A3
US6379788B2United States of AmericaB2
WO0213224A3World Intellectual Property Organization (WIPO)A3
US2002114934A1United States of AmericaA1
US2002122925A1United States of AmericaA1
WO0188572A3World Intellectual Property Organization (WIPO)A3
US6464822B1United States of AmericaB1
US2002155265A1United States of AmericaA1
KR20030003283ARepublic of KoreaA
US2003012936A1United States of AmericaA1
US2003021972A1United States of AmericaA1
EP1285286A2European Patent Office (EPO)A2
KR20030019910ARepublic of KoreaA
KR20030019911ARepublic of KoreaA
EP1309847A1European Patent Office (EPO)A1
EP1312103A2European Patent Office (EPO)A2
EP1312104A2European Patent Office (EPO)A2
US2003116270A1United States of AmericaA1
US6589650B1United States of AmericaB1
CN1429346AChinaA
CN1446370AChinaA
CN1446371AChinaA
US6632513B1United States of AmericaB1
JP2003533726AJapanA
WO03093879A1World Intellectual Property Organization (WIPO)A1
AU2003220648A1AustraliaA1
WO0213224A8World Intellectual Property Organization (WIPO)A8
US6660388B2United States of AmericaB2
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JP2004506228AJapanA
TW200403141ATaiwan Province of ChinaA
JP2004511001AJapanA
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US2004081764A1United States of AmericaA1
WO2004036270A1World Intellectual Property Organization (WIPO)A1
AU2003275431A1AustraliaA1
TW200417760ATaiwan Province of ChinaA
US6800378B2United States of AmericaB2
US6815056B2United States of AmericaB2
KR20050003398ARepublic of KoreaA
US6841190B2United States of AmericaB2
EP1502130A1European Patent Office (EPO)A1
CN1196946CChinaC
KR20050073491ARepublic of KoreaA
EP1554610A1European Patent Office (EPO)A1
JP2005524113AJapanA
CN1659453AChinaA
AU2001281141B2AustraliaB2
CN1703631AChinaA
JP2006503332AJapanA
EP1285286B1European Patent Office (EPO)B1
AT324599TThis recordAustriaT
ATE324599T1AustriaT1
DE60119093D1GermanyD1
AU2001281202B2AustraliaB2
DE60119093T2GermanyT2
TWI280918BTaiwan Province of ChinaB
TWI282443BTaiwan Province of ChinaB
KR100790051B1Republic of KoreaB1
KR100813737B1Republic of KoreaB1
US7351470B2United States of AmericaB2
KR20080030695ARepublic of KoreaA
CN100385260CChinaC
KR100847390B1Republic of KoreaB1