Nova Patents
AT321899T

Method for making carbon doped oxide film

Abstract

The deposition and carbon dioxide (CDO). The deposition method, comprising providing substrate; As in the presence of a substrate, to the oxygen is arranged in the carbon oxide precursor. Mixed carbon dioxide film to form a substrate. The other, wherein the substrate is detect of the chemical gas phase depositing device is. The auxiliary accompanies gas is mixed carbon precursor oxide and oxygen is manipulated,) is formed to produce the carbon dioxide film on the substrate.

Term

No projected expiry on record.

  1. Priority
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13 members in 8 offices

This recordMember, by publication datePriority claim

Priority claims1

Priority claims
DocumentOfficeKindDate
97222801United States of AmericaA

Members13

Family members, oldest first
DocumentOfficeKind
WO03031676A1World Intellectual Property Organization (WIPO)A1
US2003077921A1United States of AmericaA1
US6677253B2United States of AmericaB2
US2004043555A1United States of AmericaA1
EP1432843A1European Patent Office (EPO)A1
CN1723295AChinaA
EP1432843B1European Patent Office (EPO)B1
AT321899TThis recordAustriaT
ATE321899T1AustriaT1
DE60210337D1GermanyD1
MY122888AMalaysiaA
DE60210337T2GermanyT2
TWI297738BTaiwan Province of ChinaB