Method and apparatus for providing uniform gas delivery to substrates in cvd and pecvd processes

(57) A summary and solution means The showerhead dispersion equipment for CVD processes, The independent 1st channel domain of the 1st plurality which has each gas supply port from the 1st side of equipment to a concentric channel and each channel 1st channel radiately, The independent 2nd channel domain of the 2nd plurality which has a concentric channel and a pattern of the diffuser passage from the 2nd channel to the 2nd side of equipment radiately, It has a movement region between the 1st channel domain that has at least one move gas passage which tells gas, and the 2nd channel domain in the 2nd corresponding channel of the 2nd domain from the each 1st channel of the 1st domain. As for showerhead dispersion equipment, the 1st side and a supply port have a vacuum seal interface in which direction separates from a reactor chamber, and the pattern of the 2nd side and the diffuser passage from the 2nd channel attaches showerhead equipment to a CVD reactor chamber so that an opening may be carried out to a reactor chamber.