Nova Patents
AT299275T

Photoresist composition for deep uv radiation containing an additive

Abstract

The invention relates to's radiation sensitive optical resist composition to deep ultraviolet, and natural photoresist composition in 100-200 nm of range. The optical resist composition comprises a) by hand the resistance peroxide and comprises at least one acid instability two bases and a, a clock a base and device; ab) capable of generating acid composite when the radiating; With a) reducing the electronic and additive of ion pair photoresist image influence.

Term

No projected expiry on record.

  1. Priority
  2. Filed
  3. Granted
  4. Today

15 members in 10 offices

This recordMember, by publication datePriority claim

Priority claims2

Priority claims
DocumentOfficeKindDate
3716101United States of AmericaA
0211977European Patent Office (EPO)W

Members15

Family members, oldest first
DocumentOfficeKind
US2003087180A1United States of AmericaA1
WO03040826A1World Intellectual Property Organization (WIPO)A1
US6723488B2United States of AmericaB2
EP1444551A1European Patent Office (EPO)A1
JP2005508527AJapanA
CN1623121AChinaA
KR20050056913ARepublic of KoreaA
EP1444551B1European Patent Office (EPO)B1
AT299275TThis recordAustriaT
ATE299275T1AustriaT1
DE60204980D1GermanyD1
TWI251122BTaiwan Province of ChinaB
DE60204980T2GermanyT2
CN1306340CChinaC
MY130283AMalaysiaA