Stabilized alkaline compositions for cleaning microelectronic substrates

The invention provides an aqueous alkaline compounds, by dropping it in the micro industry photo-negative photoresist residue and other pollutants to stripping or cleaning semiconductor chip substrate. These combination property General contains (a) a or multiple not with metal ion of alkali, its dosage enough to produced about for 10-13 of pH value, and a or multiple dip bath stability agent, it at least has a pKa value for 10-13, to in using process in the keep this pH value; (b) depending on needs joined about 0.01 (weight)%-about 5 (weight)% (with SiO2% said) of not with metal ion of water-soluble Portland; (c) depending on needs joined about 0.01 (weight)%-about 10 (weight)% One or more of chelating agent; (d) as necessary to include approximately 0.01 (weight) of about 80%-(weight) of one or more% of water soluble organic solvent; and (e) as necessary to include approximately 0.01 (weight) of about 1%-(weight)% water-soluble surfactants.