AT280806T

Alkoxysilane/organic polymer composition for thin insulating film production and use thereof

Abstract

A method of making and inner alkoxy silane/organic polymer composition, said composition comprising (A) a special alkoxy silane, (B) a special organic polymer, is used to said alkoxy silane (A) and (C) and organic polymer (B) solvent, the solvent comprises one having amide group and/or an ester of organic solvent; A silicon/organic polymer compound insulation film, wherein the insulation film is formed by the composition of the film, and dewatering and film alkoxy silane conducted wherein the alkoxysilane gel gelation gelling, and removing the residual solvent in the film; obtainingThe preparation method of wherein said composite film organic polymer and celluar silica film obtained by. The two of the film not only a low coefficient of dielectric constant and is suitable for a semiconductor element the insulating layer of multiple connecting, and can be in an appropriate the preparation method of use of semiconductor element manufacturing process.

Term

No projected expiry on record.

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21 members in 12 offices

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Priority claims
DocumentOfficeKindDate
18976797JapanA
9803186JapanW

Members21

Family members, oldest first
DocumentOfficeKind
CA2289782A1CanadaA1
WO9903926A1World Intellectual Property Organization (WIPO)A1
JPH1135313AJapanA
AU8242798AAustraliaA
EP0997497A1European Patent Office (EPO)A1
CN1257529AChinaA
TW401376BTaiwan Province of ChinaB
KR20010012887ARepublic of KoreaA
EP0997497A4European Patent Office (EPO)A4
RU2180671C2Russian FederationC2
KR100334150B1Republic of KoreaB1
US6448331B1United States of AmericaB1
CN1125138CChinaC
CA2289782CCanadaC
EP0997497B1European Patent Office (EPO)B1
AT280806TThis recordAustriaT
ATE280806T1AustriaT1
DE69827259D1GermanyD1
DE69827259T2GermanyT2
JP4025389B2JapanB2
JP4093596B2JapanB2