Phase shifting circuit manufacture method and apparatus

METHOD AND DEVICE TO CREATE A MASK phase shift mask STRUCTURE AND TO ENTER THE DESIGNS OF INTEGRATED CIRCUITS. An embodiment of the invention includes a two-USE MASKS. The first mask is a mask PHASE SHIFTING AND THE SECOND IS A MASK WITH ONE PHASE STRUCTURE. THE MASK phase shift DEFINE AREAS MAINLY REQUIRING PHASE SHIFTING. THE MASK WITH ONE PHASE STRUCTURE DEFINE AREAS MAINLY not requiring phase shift. THE MASK WITH ONE PHASE STRUCTURE WARNS THAT ALSO AREAS BORREN phase shift and avoid the creation of areas ARTIFACT UNDESIRABLE that would be created OTHERWISE USING THE MASK phase shift. ARISE BOTH MASKS OF A SET OF MASKS USED IN PROCESS TECHNOLOGY WITH A HIGHER MINIMUM SIZE.