Method and apparatus for the combustion chemical vapor deposition of films and coatings

(57) the equipment for attaining the method of coating a substrate by summary combustion chemical vapor deposition, and its method, . Whether career solution is mixed with a reagent, a reagent mixture is made, the reagent mixture is ignited, and a flame is generated, and Or the reagent mixture is passed in a plasma torch, and at least one copy of a reagent is evaporated in it, it is considered as the gaseous phase, the gaseous phase of the reagent is contacted to a substrate, and coating of the reagent which can be controlled from at least one copy of the gaseous phase to have preferred orientation on a substrate is made to vapor-deposit. The figure shows the outline of the CCVD equipment which can arrange a substrate (22) between the inner flame (18a) in the reduced zone (32) of a スミセル separator (30), and an outer flame (18b).