Apparatus and method for delivering reagents in vapor form to a cvd reactor

(57) Process system containing the liquid reagent evaporation and the feed unit (300) containing the evaporation room housing (302) which adjoins the wall surface (320) in a housing and has a porous evaporation element (340) for specifying a summary liquid channel (332, 324, 326, 328) inside. In order to carry out pumping of the air * or the moisture * susceptibility liquid in this system, a pump assembly object (10) can be used, and it is covered with the inactive medium and/or process liquid which have a low steam pressure liquid ingredient effective in the portion with which the pump became wet here controlling corrosion or creation of particles. In respect of others, the present invention A consistency, reliability, By and periodical flash cleaning of this evaporator element for making an operation life increase. It is related with the means and method for protecting a materials reagent evaporator (17) from harmful influence called the increase in a solid by oxidative disassembly of the materials reagent which generates the solid output which causes the early decomposition, the jam, and the inefficient evaporation on the evaporator element of a materials reagent during the use in chemical vapor deposition (CVD).